|
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Make |
Model |
|
|
$ |
|
|
94266
|
Olympus
|
Olympus |
MX50T-F |
in Light Microscopes
OLYMPUS SEMICONDUCTOR INSPECTION MICROSCOPE:Semiconductor Inspection Microscope Reflected and Transmitted Light
|
1
|
|
|
|
|
|
28015
|
Olympus
|
Olympus |
SZ3060 |
in Light Microscopes
OLYMPUS STEREO MICROSCOPE 10X - 40X:Stereo Microscope
|
7
|
|
|
F* |
|
|
185484
|
Olympus
|
Olympus |
SZ3060 |
in Light Microscopes
OLYMPUS STEREO MICROSCOPE 10X - 40X:Stereo Microscope and Boom Stand Fostec/Kramer light source and dual light pipe in photos are not included. Please inquiry on availability.
|
1
|
|
|
|
|
|
1892
|
Olympus
|
Olympus |
VMZ |
in Light Microscopes
OLYMPUS STEREO MICROSCOPE 10X - 40X:Stereo Zoom Microscope
(stand not included)
|
3
|
|
500.00 |
|
|
|
1969
|
Olympus
|
Olympus |
SZ4045 ESD |
in Light Microscopes
OLYMPUS STEREO MICROSCOPE 7X - 40X:ESD Stereo Zoom Microscope With ESD Incident Light Stand
|
6
|
|
|
|
|
|
148313
|
Olympus
|
Olympus |
SZ4045 |
in Light Microscopes
OLYMPUS STEREO MICROSCOPE 7X - 40X:Stereo Zoom Microscope
|
1
|
|
|
|
|
|
93496
|
Olympus
|
Olympus |
SZ3060ESD |
in Light Microscopes
OLYMPUS STEREO MICROSCOPE 9X - 40X:Stereo Zoom Microscope
|
1
|
|
|
|
|
|
1970
|
Olympus
|
Olympus |
SZ4045 |
in Light Microscopes
OLYMPUS STEREO ZOOM MICROSCOPE 7X - 40X:Stereo Zoom Microscope
|
1
|
|
|
|
|
|
217522
|
Olympus
|
Olympus |
STM6-F00-3 |
in Microscopes
OLYMPUS TWO AXIS MEASURING MICROSCOPE 150MM X 100MM 0.5 MICRON:Olympus Measuring Microscope
|
1
|
|
|
F* |
|
|
176562
|
Opti Temp Inc.
|
Opti Temp Inc. |
OTC-.5A |
in Baths and Chillers
OPTI TEMP INC. AIR COOLED CHILLER, 1340 WATT:High Temperature Portable Air Cooled Chiller
|
1
|
|
|
|
|
|
176931
|
Opti Temp Inc.
|
Opti Temp Inc. |
OTC-.5A |
in Baths and Chillers
OPTI TEMP INC. AIR COOLED CHILLER, 1340 WATT:High Temperature Portable Air Cooled Chiller
|
1
|
|
|
|
|
|
43557
|
Osaka Vacuum
|
Osaka Vacuum |
TH542 |
in Vacuum Pumps
OSAKA VACUUM TURBO PUMP:Turbo Pump
|
1
|
|
|
|
|
|
155807
|
Osaka Vacuum
|
Osaka Vacuum |
TH1502 |
in Vacuum Pumps
OSAKA VACUUM TURBO PUMP :Turbo Pump
|
1
|
|
|
|
|
|
3246
|
Osaka Vacuum
|
Osaka Vacuum |
TG1113EM |
in Vacuum Pumps
OSAKA VACUUM TURBO PUMP 1,100 L/S:Turbo Pump
|
1
|
|
9,900.00 |
|
|
|
151290
|
Osaka Vacuum
|
Osaka Vacuum |
TG1100M |
in Vacuum Pumps
OSAKA VACUUM TURBO PUMP 1,100 L/S:Turbo Pump
|
1
|
|
9,900.00 |
|
|
|
8835
|
Osaka Vacuum
|
Osaka Vacuum |
TG2003MCA |
in Vacuum Pumps
OSAKA VACUUM TURBO PUMP 2,000 L/S:Turbo Pump
|
1
|
|
|
|
|
|
164755
|
Osaka Vacuum
|
Osaka Vacuum |
TG2003MCA |
in Vacuum Pumps
OSAKA VACUUM TURBO PUMP 2,000 L/S:Turbo Pump with the controller
|
1
|
|
|
|
|
|
140058
|
Osaka Vacuum
|
Osaka Vacuum |
TG 56CA |
in Vacuum Pumps
OSAKA VACUUM TURBO PUMP 44 L/S:Turbo Pump
|
1
|
|
|
|
|
|
140322
|
Osaka Vacuum
|
Osaka Vacuum |
TC1100 |
in Vacuum Pump Controllers
OSAKA VACUUM TURBOMOLECULAR VACUUM PUMP CONTROLLER :Turbo Vacuum Pump Controller
Osaka Vacuum TC 1100 New Condition, Never Used
|
1
|
|
|
F* |
|
|
242093
|
Osiris International
|
Osiris International |
DEFIXX 15m |
in Wafer Fabrication Equipment
OSIRIS INTERNATIONAL MANUAL WAFER DEBONDING TOOL:Manual Wafer Debonding Tool
|
1
|
|
|
F* |
|
|
181540
|
Oxford Instruments
|
Oxford Instruments |
Plasmalab System 100 |
in Production Tools
OXFORD INSTRUMENTS PLASMALAB 100 PECVD:PECVD TEOS Tool with Load Lock
NB: System needs a computer-software upgrade. Selling this system AS IS, WHERE IS.
|
1
|
|
|
F* |
|
|
41591
|
Particle Meas Sys
|
Particle Meas Sys |
AM 24 |
in Clean Room Equipment
PARTICLE MEASURING SYSTEMS AM 24:Aerosol Manifold with Collection Pumps New--Never Used, Year 2001
Provides Multiplex Air Samples for Particle Counters
This item was part of a complete Aerosel and Liquid Particle monitoring system. The following items are also part of that system: Item: 45581--PMS LiQuilaz Item: 41581--PMS LPS A-310 Particle Counter CE Marked
|
2
|
|
|
|
|
|
172394
|
Particle Meas Sys
|
Particle Meas Sys |
HSLI M50E |
in Clean Room Equipment
PARTICLE MEASURING SYSTEMS DI WATER PARTICLE COUNTER:DI Water Particle Counter
|
1
|
|
|
|
|
|
41582
|
Particle Meas Sys
|
Particle Meas Sys |
LPS A-310 |
in Clean Room Equipment
PARTICLE MEASURING SYSTEMS LASER PARTICLE SENSOR:Laser Particle Sensor New--Never Used
Particle Measuring Systems LPS A-310
|
2
|
|
|
F* |
|
|
41581
|
Particle Meas Sys
|
Particle Meas Sys |
LiQuilaz S 02 |
in Clean Room Equipment
PARTICLE MEASURING SYSTEMS LIQUILAZ:Particle Counting Spectrometer for Liquids. New--Never Used
Particle Measuring Systems LiQuilaz S 02
|
1
|
|
|
|
|
|
89145
|
PCB
|
PCB |
J353B01 |
in Vibration and Shock
PCB ACCELEROMETER:Accelerometer
|
1
|
|
|
|
|
|
208105
|
Edwards
|
Edwards |
1002 |
in Vacuum Gauge Controllers
Penning 1002 Vacuum Gauge Controller:Penning 1002 Vacuum Gauge Controller
|
1
|
|
199.00 |
|
|
|
136324
|
Perkin Elmer
|
Perkin Elmer |
Unknown |
in Vacuum Process Equipment
PERKIN ELMER ELECTRICAL FEEDTHROUGH:Electrical Feedthrough
|
1
|
|
235.00 |
|
|
|
295
|
Perkin Elmer
|
Perkin Elmer |
None |
in Vacuum Process Equipment
PERKIN-ELMER ROTARY FEEDTHROUGH:Rotary Feedthrough
|
1
|
|
250.00 |
|
|
|
196949
|
Pfeiffer Vacuum
|
Pfeiffer Vacuum |
A460082-035 |
in Vacuum Pumps
PFEIFFER HEATER BAND CABLE 3.5M:Heater Band Cable For ATH M Series Turbo Pump
|
2
|
|
|
F* |
|
|
196836
|
Pfeiffer Vacuum
|
Pfeiffer Vacuum |
ATH 2300 M |
in Vacuum Pumps
PFEIFFER TURBO PUMP WITH OBC V4 PROFIBUS CONTROLLER:Turbopump - New, Never Used With OBC V4 Profibus Controller - Used
|
1
|
|
|
F* |
|
|
196845
|
Pfeiffer Vacuum
|
Pfeiffer Vacuum |
ATH 2804 M |
in Vacuum Pumps
PFEIFFER TURBOPUMP 2,350 L/S:Turbopump New -- Never Used
|
2
|
|
|
F* |
|
|
54909
|
Pfeiffer Vacuum
|
Pfeiffer Vacuum |
UNIDRY 050-4 |
in Vacuum Pumps
PFEIFFER VACUUM DRY VACUUM PUMP:Dry Vacuum Pump with Electronic and Gas Controls
|
1
|
|
|
|
|
|
13492
|
Pfeiffer Vacuum
|
Pfeiffer Vacuum |
DUO 35C |
in Vacuum Pumps
PFEIFFER VACUUM ROTARY VANE PUMP:Rotary Vane Pump - Corrossive Duty
Pfeiffer DUO 35C
|
1
|
|
|
|
|
|
50913
|
Pfeiffer Vacuum
|
Pfeiffer Vacuum |
WOT 400-D4 |
in Vacuum Pumps
PFEIFFER VACUUM UNIVERSAL DRY BACKING PUMP SYSTEM:Universal Dry Vacuum Pump System. For harsh duty processes.
|
1
|
|
|
|
|
|
26911
|
Philips
|
Philips |
DCD 120 |
in Wafer Manufacturing Metrology Equipment
PHILIPS DOUBLE CRYSTAL DIFFRACTOMETER:Double Crystal Diffractometer
Double Crystal Diffractometer optimized for fast rocking curve analysis of pseudomorphic epitaxial layer structures.
|
1
|
|
|
F* |
|
|
208462
|
Plasma-finish
|
Plasma-finish |
V15G |
in Plasma Etch Equipment
PLASMA-FINISH GMBH PLASMA ETCHER SYSTEM 300 WATT:Plasma Box Etcher System PINK GmbH acquired Plasma-Finish - now called PINK GmbH Plasma-Finish
|
1
|
|
|
|
|
|
3011
|
Plasma-Therm
|
Plasma-Therm |
Wafer Batch 740/740 |
in Single Chamber Plasma Tools
PLASMA-THERM DUAL PLASMA ETCH AND REACTIVE ION ETCH SYSTEM 200MM:Dual Plasma Etch and Reactive Ion Etch Processing Systems
System consists of a process chamber, upper electrode (with gas feed), and substrate electrode.
|
1
|
|
|
|
|
|
4054
|
Plasma-Therm
|
Plasma-Therm |
73/74 |
in Single Chamber Plasma Tools
PLASMA-THERM PECVD AND DUAL PLASMA ETCH/REACTIVE ION ETCH SYSTEM:Combination PECVD and Dual Plasma Etch/Reactive Ion Etch Processing Systems
|
1
|
|
|
|
|
|
50854
|
Plasma-Therm
|
Plasma-Therm |
VII 734 |
in Single Chamber Plasma Tools
PLASMA-THERM PLASMA DEPOSITION SYSTEM/RIE:Combination Plasma Deposition System/RIE
|
1
|
|
|
F* |
|
|
11919
|
Plasma-Therm
|
Plasma-Therm |
VII 734MF |
in Single Chamber Plasma Tools
PLASMA-THERM REACTIVE ION ETCH/PLASMA ETCH SYSTEM:Plasmatherm RIE/Plasma Etch System
|
1
|
|
|
F* |
|
|
206582
|
Plasma-Therm
|
Plasma-Therm |
BT 6" RIE MF |
in Single Chamber Plasma Tools
PLASMATHERM BatchTop VII REACTIVE ION ETCH SYSTEM 6":Reactive Ion Etch System BatchTop VII
|
1
|
|
|
|
|
|
45428
|
Plasma-Therm
|
Plasma-Therm |
790 ICP |
in Single Chamber Plasma Tools
PLASMATHERM ICP PLASMA ETCHER:Inductively Coupled Plasma Etcher with 9.5 Inch Electrode
|
1
|
|
|
F* |
|
|
147470
|
Plasma-Therm
|
Plasma-Therm |
790 PECVD 11" |
in Production Tools
PLASMATHERM PECVD 790:Refurbished PECVD System with 11" Electrode
|
1
|
|
|
F* |
|
|
124315
|
Plasma-Therm
|
Plasma-Therm |
790 11" RIE |
in Single Chamber Plasma Tools
PLASMATHERM REACTIVE ION ETCH SYSTEM 11":Reactive Ion Etch System - 11" Electrode
|
1
|
|
|
F* |
|
|
45430
|
Plasma-Therm
|
Plasma-Therm |
790 11 RIE |
in Single Chamber Plasma Tools
PLASMATHERM REACTIVE ION ETCH SYSTEM 200MM:Reactive Ion Etch System 11" Electrode
|
1
|
|
|
|
|
|
201152
|
Plasma-Therm
|
Plasma-Therm |
790 RIE PECVD 11" |
in Single Chamber Plasma Tools
PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX:Reactive Ion Etch / PECVD system mounted in glovebox with an intregrated air purfier O2 and H20 sensors on board.
Both top and bottom electrodes can be powered sequentially.
|
1
|
|
|
|
|
|
142821
|
Plasma-Therm
|
Plasma-Therm |
Unaxis 790 |
in Single Chamber Plasma Tools
PLASMATHERM UNAXIS DUAL CHAMBER SHUTTLE LOAD LOCK SYSTEM:Shuttle Load Lock System
|
1
|
|
|
|
|
|
30246
|
Plasma-Therm
|
Plasma-Therm |
VLR 700 VLR-PM1-ICRB-PM |
in Production Tools
PLASMATHERM VLR 700:Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes.
|
1
|
|
|
F* |
|
|
223090
|
CBI
|
CBI |
2X2LOTO15 |
in Physical Vapor Deposition Equipment
Pneumatic Lockout Tagout Box - 15 Channel:Custom fabricated assembly designed to be installed into a raised floor system.
|
10
|
|
|
|
|
|
133352
|
PolyScience
|
PolyScience |
6305P |
in Baths and Chillers
POLYSCIENCE LEGACY RECIRCULATING CHILLER 1100 WATTS:PolyScience Recirculating Chiller
|
1
|
|
|
|
|
|
140735
|
Power Ten Inc
|
Power Ten Inc |
P62B-8250 |
in Power Supplies
POWER TEN DIRECT CURRENT POWER SUPPLY 8 V, 250 A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
1,730.00 |
|
|
|
83028
|
Power Ten Inc
|
Power Ten Inc |
P63C-15220AB |
in Power Supplies
POWER TEN INC. DC POWER SUPPLY 15V, 220A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
1,750.00 |
|
|
|
39613
|
Power Ten Inc
|
Power Ten Inc |
P62B-20150 |
in Power Supplies
POWER TEN INC. DC POWER SUPPLY 20V, 150A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
3
|
|
1,585.00 |
|
|
|
83027
|
Power Ten Inc
|
Power Ten Inc |
P62B-5325AB |
in Power Supplies
POWER TEN INC. DC POWER SUPPLY 5V, 325A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
1,450.00 |
|
|
|
242605
|
Power Ten Inc
|
Power Ten Inc |
P66C-60330AB |
in Power Supplies
POWER TEN INC. DC POWER SUPPLY 60V, 330A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
|
|
|
|
102308
|
Power Ten Inc
|
Power Ten Inc |
4500C-6040 |
in Power Supplies
POWER TEN INC. DC POWER SUPPLY 60V, 40A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
2
|
|
|
|
|
|
88973
|
Precision Scientific
|
Precision Scientific |
19 |
in Ovens
PRECISION SCIENTIFIC VACUUM OVEN 200ºC:Vacuum Oven
|
1
|
|
|
F* |
|
|
14050
|
Process Technology
|
Process Technology |
HCT 72-4-G |
in Water Handling Equipment
PROCESS TECHNOLOGY DI WATER HEATER 72KW:DI Water heater
|
1
|
|
|
F* |
|
|
22132
|
Process Technology
|
Process Technology |
HCQ12 |
in Water Handling Equipment
PROCESS TECHNOLOGY HCQ12:Infrared Chemical Heater
|
1
|
|
|
F* |
|
|
230353
|
Advanced Energy
|
Advanced Energy |
B0111-DPXX-105-XX |
in Power Supplies
Profibus communication board for Advanced Energy CESAR generators:Profibus communication board for Advanced Energy CESAR generators
|
5
|
|
|
|
|
|
163645
|
Pure Air Systems
|
Pure Air Systems |
S DOC-10 |
in Semiconductor Manufacturing Facilities Equipment
PURE AIR SYSTEMS PYROPHORIC GAS ABATEMENT SYSTEM:Pyrophoric Gas Abatement System
|
1
|
|
|
|
|
|
160264
|
Quintel
|
Quintel |
Q-804 |
in Mask Aligners
QUINTEL MASK ALIGNER/EXPOSURE SYSTEM:Mask Aligner/Exposure System
|
1
|
|
|
F* |
|
|
24564
|
Quintel
|
Quintel |
UL 7000 IR |
in Mask Aligners
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM:Mask Aligner with IR Backside Alignment
Quintel acquired by Neutronix
|
1
|
|
|
F* |
|
|
170411
|
Unknown
|
Unknown |
None |
in Vacuum Process Equipment
REDUCING CF FLANGE, 6" O.D.:CF Reducing Flange 2.75" O.D. Small Flange x 6" O.D. Large Flange
|
1
|
|
100.00 |
|
|
|
170342
|
Unknown
|
Unknown |
None |
in Vacuum Process Equipment
REDUCING FLANGE, 8" O.D.:CF Reducing Flange 2.75" O.D. Small Flange x 8" O.D. Large Flange
|
1
|
|
168.00 |
|
|
|
198107
|
Neslab
|
Neslab |
RTE-110 |
in Baths and Chillers
REFRIGERATED BATH CIRCULATOR 500 WATT:Bath/Circulator
|
1
|
|
|
|
|
|
2601
|
Reichert-Jung
|
Reichert-Jung |
Photostar |
in Microscope Parts and Accessories
REICHERT AUTOMATIC CAMERA SYSTEM:Automatic Camera System
Fits 1 1/8" diameter phototube
|
1
|
|
|
F* |
|
|
149933
|
Reichert Inc
|
Reichert Inc |
Ultracut S-EM FCS |
in Sample Preparation Equipment
REICHERT/LEICA LOW TEMPERATURE SECTIONING SYSTEM:Low Temperature Sectioning System
|
1
|
|
|
F* |
|
|
187522
|
Reynoldstech
|
Reynoldstech |
Custom |
in Wafer Fabrication Equipment
REYNOLDSTECH 16 'X 16', HOT PLATE 200° C, :200° C 16 " x 16" Hot Plate with Vacuum Hold Down
|
1
|
|
5,750.00 |
|
|
|
181396
|
Reynoldstech
|
Reynoldstech |
Resist Develop Station |
in Wafer Cleaners
REYNOLDSTECH PHOTORESIST DEVELOP HOOD:Photoresist Develop Station with Headway Wafer Spin Cleaner
|
1
|
|
|
F* |
|
|
6927
|
Rigaku
|
Rigaku |
10C97121400 |
in Vacuum Process Equipment
RIGAKU HOLLOW FERROFLUIDIC FEEDTHROUGH:Hollow Ferrofluidic Feedthrough
|
2
|
|
|
|
|
|
103332
|
Rigaku
|
Rigaku |
TXRF 300S |
in Spectrometers
RIGAKU X-RAY FLUORESENCE SPECTROMETER:X-Ray Fluoresence Spectrometer Model: TXRF 300S
|
1
|
|
|
F* |
|
|
185791
|
Rosemount Analytical
|
Rosemount Analytical |
228-02 |
in Semiconductor Manufacturing Facilities Equipment
ROSEMOUNT ANALYTICAL TOROIDAL SUBMERSION INSERTION CONDUCTIVITY SENSOR:Conductivity Toroidal Submersion Insertion Sensor New Surplus -- Never Used
|
2
|
|
500.00 |
|
|
|
92392
|
Unknown
|
Unknown |
B66934 |
in Vacuum Process Equipment
ROTARY VACUUM FEEDTHROUGH:Rotary Vacuum Feedthrough
Hollow shaft
|
1
|
|
1,200.00 |
|
|
|
92393
|
Unknown
|
Unknown |
B66968 |
in Vacuum Process Equipment
ROTARY VACUUM FEEDTHROUGH:Rotary Vacuum Feedthrough
Hollow shaft
|
1
|
|
1,200.00 |
|
|
|
64223
|
Rucker & Kolls
|
Rucker & Kolls |
360 |
in Manual Probers
RUCKER & KOLLS EDGE SENSOR:Edge Sensor
|
1
|
|
375.00 |
|
|
|
62742
|
Rucker & Kolls
|
Rucker & Kolls |
329-1 |
in Manual Probers
RUCKER & KOLLS MICROPOSITIONER WITH INKER:Micropositioner w/Inker
|
1
|
|
680.00 |
|
|
|
58212
|
Rudolph Research
|
Rudolph Research |
AUTO EL RE-350 |
in Film Thickness Testers
RUDOLPH RESEARCH ELLIPSOMETER 150MM:Ellipsometer
|
1
|
|
|
|
|
|
86164
|
Rudolph Technologies
|
Rudolph Technologies |
AUTO EL |
in Film Thickness Testers
RUDOLPH RESEARCH ELLIPSOMETER 150MM:Ellipsometer
|
1
|
|
|
F* |
|
|
153509
|
Russells Tech. Prod
|
Russells Tech. Prod |
RB-8-co2 |
in Environmental and Temperature Test Chambers
RUSSELLS TECHNICAL PRODUCTS TEMPERATURE CHAMBER 200C:Temperature Chamber RB-8-co2 with Watlow F-4
|
2
|
|
|
F* |
|
|
121779
|
Samco
|
Samco |
UV-300 |
in Semiconductor Manufacturing Equipment
SAMCO UV OZONE CLEANING / STRIPPING SYSTEM:UV & Ozone Cleaning and Stripping System
Samco UV300X
|
1
|
|
|
|
|
|
62696
|
Sanso
|
Sanso |
PV2-4/BTBSC2 |
in Semiconductor Manufacturing Facilities Equipment
SANSO PV2-4:Hot Loop Cooling Pump
Applied Materials P/N 0190-18437
|
4
|
|
|
|
|
|
90691
|
Schott Fostec
|
Schott Fostec |
20500 |
in Fiber Optic Illuminators
SCHOTT FOSTEC FIBER OPTIC LIGHT SOURCE:Fiber Optic Light Source
|
1
|
|
150.00 |
|
|
|
90336
|
Sealant Equipment En
|
Sealant Equipment En |
See-Flo 690 |
in Packaging Tools
SEALANT EQUIPMENT & ENGINEERING DISPENSE SYSTEM:Positive Displacement Dispense System
|
1
|
|
|
F* |
|
|
46021
|
Seiko-Seiki
|
Seiko-Seiki |
STP-XH3203P |
in Vacuum Pumps
SEIKO SEIKI TURBO PUMP 3,150 L/S:Turbo Pump
|
1
|
|
|
|
|
|
82024
|
Seiko-Seiki
|
Seiko-Seiki |
STPH-300C with controller |
in Vacuum Pumps
SEIKO SEIKI TURBO PUMP 320 L/S:Turbo Pump With Controller
|
1
|
|
18,500.00 |
|
|
|
189746
|
Seiko-Seiki
|
Seiko-Seiki |
SCU-H1000C |
in Vacuum Pump Controllers
SEIKO SEIKI TURBO PUMP CONTROLLER:Turbo Pump Controller
New in the box
|
2
|
|
|
F* |
|
|
465
|
Seiko-Seiki
|
Seiko-Seiki |
SCU- H1000C |
in Vacuum Pump Controllers
SEIKO SEIKI TURBOMOLECULAR VACUUM PUMP CONTROL UNIT:Turbo Pump Controller
|
2
|
|
|
|
|
|
466
|
Seiko-Seiki
|
Seiko-Seiki |
SCU-600C |
in Vacuum Pump Controllers
SEIKO SEIKI TURBOMOLECULAR VACUUM PUMP CONTROL UNIT:Turbo Pump Controller
|
1
|
|
|
|
|
|
678
|
Seiko-Seiki
|
Seiko-Seiki |
SCU-600 |
in Vacuum Pump Controllers
SEIKO SEIKI TURBOMOLECULAR VACUUM PUMP CONTROL UNIT:SCU600 Controller
|
2
|
|
|
|
|
|
679
|
Seiko-Seiki
|
Seiko-Seiki |
SCU1000C |
in Vacuum Pump Controllers
SEIKO-SEIKI CONTROLLER:SCU1000C Controller
|
1
|
|
|
|
|
|
195473
|
Semiconductor Equipm
|
Semiconductor Equipm |
3100 |
in Dicing Tools
SEMICONDUCTOR EQUIPMENT CORP WAFER FILM FRAME TAPE APPLICATOR:Wafer Flim Frame Tape Applicator
|
2
|
|
|
F* |
|
|
191060
|
SemiSoft Inc.
|
SemiSoft Inc. |
MProbe VIS20 In-situ |
in Physical Vapor Deposition Equipment
SEMICONSOFT THIN FILM MEASUREMENT SYSTEM VIS:Thin Film Measurement System
The MProbe 20VIS is a desktop thin-film thickness measurement system. The measurement is based on spectroscopic reflectance and uses fiber optics retro-reflecting probe.
|
1
|
|
|
|
|
|
173594
|
Semifab
|
Semifab |
RAM E1000 |
in Semiconductor Manufacturing Facilities Equipment
SEMIFAB ENVIRONMENTAL CONTROL UNIT ECU 1000 CFM:These units have never been installed and are in their original packaging from the OEM.
The Semifab RAM-E 1000 delivers 1000 CFM of precision controlled airflow to large tool-specific mini-environments and enclosures. This high performance unit provides accurate, controlled airflow and is sized to compensate for potential pressure losses due to auxiliary chemical filtration.
|
2
|
|
|
|
|
|
186319
|
Semitool
|
Semitool |
ST-260D |
in Wafer Cleaners
SEMITOOL RHETECH SPIN RINSE DRYER:Single Stack Table Top Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
188065
|
Semitool
|
Semitool |
ST-240D |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER :Dual Stack Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
135639
|
Semitool
|
Semitool |
4600L-5-2-E-VT |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER 380 MM:Large Area Substrate Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
134446
|
Semitool
|
Semitool |
ST-240D |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER 75 MM:Dual Stack Table Top Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
170192
|
Semitool
|
Semitool |
ST-840 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 100MM:Spin Rinse Dryer up to 100mm
|
3
|
|
|
F* |
|
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