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Displaying 101-200 of 284  Page    1  2  3

	Item ID	Photo	Short Description		Product Type / Details	#		Price	Notes
			Make	Model
								$
	43052	Electronic Measuremt	Electronic Measuremt	TCR 40S70	DC Power Supplies in Power Supplies EMI DC POWER SUPPLY 40V, 70A: Direct Current Power Supply	1		2,250.00
	84072	Electronic Measuremt	Electronic Measuremt	TCR 60S18	DC Power Supplies in Power Supplies EMI DC POWER SUPPLY 60V, 18A: Direct Current Power Supply	1		1,000.00
	155418	Electronic Measuremt	Electronic Measuremt	EMS 60-80	DC Power Supplies in Power Supplies EMI DC POWER SUPPLY 60V, 80A: DC Power Supply	1		1,200.00
	81996	Electronic Measuremt	Electronic Measuremt	EMHP 10-1500-D	DC Power Supplies in Power Supplies EMI ELECTRONIC MEASUREMENTS DC POWER SUPPLY: Direct Current Power Supply	1			F*
	1001	ENI	ENI	PL3	Radio Frequency (RF) Generators in Power Supplies ENI POWER SYSTEMS PLASMALOC 3 RF GENERATOR POWER SUPPLY: Plasmaloc 3 RF Generator	1
	102336	ENI	ENI	OEM 12B	Radio Frequency (RF) Generators in Power Supplies ENI POWER SYSTEMS RF GENERATOR 1250W, 13.56 MHZ: Radio Frequency Generator Acquired by MKS Instruments Representative photo	1
	151365	ENI	ENI	OEM 12A	Radio Frequency (RF) Generators in Power Supplies ENI POWER SYSTEMS RF GENERATOR 1250W, 13.56 MHZ: Radio Frequency Generator	3
	185506	ENI Power Systems	ENI Power Systems	OEM-6AM-1B-21251	Radio Frequency (RF) Generators in Power Supplies ENI POWER SYSTEMS RF POWER SUPPLY 13.56 MHz: RF Generator	3
	993	ENI	ENI	LPG12A-21051-50	Radio Frequency (RF) Generators in Power Supplies ENI POWER SYSTEMS SOLID STATE RF GENERATOR POWER SUPPLY: Solid State RF Generator	4		2,500.00	F*
	91840	Equipe Technologies	Equipe Technologies	ATM105-1-S-CE	Wafer Transfer Units in Robotics EQUIPE TECHNOLOGIES WAFER TRANSFER ROBOT AND ALIGNER: Wafer Transfer Robot and Aligner	1
	71112	EVG	EVG	EV640	Wafer Fabrication Equipment - Other in Wafer Fabrication Equipment EV GROUP SMARTVIEW BOND ALIGNER: Wafer to Wafer Bond Aligner	1
	148001	EVG	EVG	Smartview Bond Aligner	Wafer Fabrication Equipment - Other in Wafer Fabrication Equipment EV GROUP SMARTVIEW® BOND ALIGNER: 2005 SmartView® Semi-Automated Wafer-to-Wafer Bond Aligner   The EV Group (EVG) Smartview® Bond aligner and EV Group (EVG) 540 Wafer Bonder are used in the production of MEMs and in the emerging fields of 3D IC Packaging and Through-Silicon Via (TSV) interconnects. A 3D integrated circuit (3D IC) is a single integrated circuit built by stacking silicon wafers and/or dies and interconnecting them vertically. This is achieved by persisly aligning devices on two silicon wafers and subsequently bonding them together. The result is they behave as a single device. By using TSV technology, 3D ICs can pack a great deal of functionality into a small “footprint.” This technology is not olny used in the production of MEMS, but also in the fabrication of CMOS image sensors, and memory devices.	1
	43636	Hamatech	Hamatech	104180	Manual Spray Brush Scrubbers in Spray/Brush Scrubbers HAMATECH AUTOMATIC SUBSTRATE CLEANER: Automatic Substrate Cleaner	1			F*
	41529	Headway	Headway	CB15	Manual Photoresist Coaters in Photoresist Coaters HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER: Manual Photoresist Spin Coater	1			F*
	163850	Heraeus	Heraeus	09751751	Electron Beam Evaporators in Evaporation Tools HERAEUS NOBLELIGHT INFRARED EMITTER ASSEMBLY: Infrared Emitter Assembly	1
	94318	Hewlett Packard	Hewlett Packard	6200B	DC Power Supplies in Power Supplies HEWLETT PACKARD 6200B: Dual Output Power Supply	1		300.00
	102316	Hewlett Packard	Hewlett Packard	6453A	DC Power Supplies in Power Supplies HEWLETT PACKARD DC POWER SUPPLY: Direct Current Power Supply	2
	38552	Hewlett Packard	Hewlett Packard	6644A	DC Power Supplies in Power Supplies Hewlett Packard DC POWER SUPPLY: Direct Current Power Supply	3		995.00
	93772	Hewlett Packard	Hewlett Packard	6633B	DC Power Supplies in Power Supplies HEWLETT PACKARD DC POWER SUPPLY 50V, 2A: DC Power Supply	1		1,500.00
	6777	Hewlett Packard	Hewlett Packard	6130C	Power Supplies - Other in Power Supplies HEWLETT PACKARD DIGITAL VOLTAGE SOURCE: Digital Voltage Source	2		950.00
	161017	Hewlett Packard	Hewlett Packard	6012B	DC Power Supplies in Power Supplies HEWLETT PACKARD DIRECT CURRENT POWER SUPPLY: Direct Current Power Supply	1
	6770	Hewlett Packard	Hewlett Packard	6255A	DC Power Supplies in Power Supplies HEWLETT PACKARD DUAL OUTPUT DC POWER SUPPLY: Dual Output Direct Current Power Supply	1		450.00
	6773	Hewlett Packard	Hewlett Packard	6233A	DC Power Supplies in Power Supplies HEWLETT PACKARD DUAL OUTPUT DC POWER SUPPLY: Dual Output Direct Current Power Supply	1		450.00
	47344	Hewlett Packard	Hewlett Packard	6624A (4) Output	DC Power Supplies in Power Supplies HP DC POWER SUPPLY: Direct Current Power Supply	1		1,350.00	F*
	32822	Hewlett Packard	Hewlett Packard	6622A	DC Power Supplies in Power Supplies HP DC POWER SUPPLY 20V, 4A: Direct Current Power Supply	1		1,495.00
	79491	Hewlett Packard	Hewlett Packard	6266B	DC Power Supplies in Power Supplies HP DC POWER SUPPLY 40V, 5A: Direct Current Power Supply	1		450.00
	47349	Hewlett Packard	Hewlett Packard	6551A	DC Power Supplies in Power Supplies HP DC POWER SUPPLY 8V, 50A: Direct Current Power Supply	1		1,250.00
	206648	Imtec Acculine	Imtec Acculine	QZ-A1502	Wet Process Equipment - Other in Wet Processing Equipment IMTEC ACCUBATH CONSTANT TEMPERATURE QUARTZ BATH: Constant Temperature Bath	1		1,575.00	F*
	206630	Imtec Acculine	Imtec Acculine	QRT/S-A1502	Wet Process Equipment - Other in Wet Processing Equipment IMTEC ACCUBATH QUARTZ PROCESS BATH: Recirculating Quartz Bath	1		1,850.00
	142698	Inficon	Inficon	782-900-030	Physical Vapor Deposition Equipment - Other in Physical Vapor Deposition Equipment INFICON OPTICAL DETECTOR: Optical Detector Inficon Guardian IV, 782-900-030	2		3,310.00
	63730	Inficon	Inficon	SENTINEL III	Physical Vapor Deposition Equipment - Other in Physical Vapor Deposition Equipment INFICON THIN FILM DEPOSITION CONTROLLER: Thin Flim Deposition Controller Uses EIES sensor technology and provides complete automatic control of two materials, either sequential or codeposited vacuum processes	1			F*
	160726	Interlab	Interlab	MRS1583	Acid Wet Stations in Wafer Cleaners INTERLAB MICRO RINSE SYSTEM: Micro Rinse System	1
	186705	ITEC Powertron	ITEC Powertron	3000S-CR	Power Supplies - Other in Power Supplies ITEC POWERTRON 1500 WATT CURRENT SOURCE: Current Source	5
	186707	ITEC Powertron	ITEC Powertron	1500S-CRH	Power Supplies - Other in Power Supplies ITEC POWERTRON 750 WATT CURRENT SOURCE: Current Source	1
	142856	Japan Radio Co.	Japan Radio Co.	NAH-1030-2A/NFC-30-2A	Radio Frequency (RF) Generators in Power Supplies JAPAN RADIO CO. RF GENERATOR/MATCHING NETWORK: RF Generator/Matching Network	2
	112607	Karl Suss	Karl Suss	MA 150M	Contact/Proximity Mask Aligners in Mask Aligners KARL SUSS MANUAL MASK ALIGNER 150 MM: Manual Mask Aligner The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.	1			F*
	190950	Kaufman & Robinson I	Kaufman & Robinson I	eH1000 HC/F	Ion Beam Equipment - Other in Ion Beam Equipment KAUFMAN & ROBINSON END-HALL ION SOURCE WITH WATER COOLED FRONT PLATE: Gridless End-Hall Ion Source With Water Cooled Front Plate	1			F*
	186213	Keyence	Keyence	MD-F3000W	Laser Marking Systems in Lasers KEYENCE HIGH POWER FIBER LASER MARKER 30W: Fiber Laser Marker The optimum fiber laser marker solution for black-color marking and engraving on metal where a high output power is required	1			F*
	34890	LAM Research Co	LAM Research Co	490 AUTO ETCH	Poly/Nitride Etchers in Single Chamber Plasma Tools LAM RESEARCH SIX INCH NITRIDE ETCHER: Six Inch Nitride Etcher Automated Cassette to Cassette single wafer etching.	1			F*
	245029	Electronic Measuremt	Electronic Measuremt	EMS 250-10-2-D	DC Power Supplies in Power Supplies LAMBDA ELECTRONIC MEASUREMENTS INC DC POWER SUPPLY 250V, 10A: DC Power Supply	1		1,450.00
	182177	Electronic Measuremt	Electronic Measuremt	EMS 5-50	DC Power Supplies in Power Supplies LAMBDA ELECTRONIC MEASUREMENTS INC DC POWER SUPPLY 5V, 50A: DC Power Supply	1		500.00
	190755	Electronic Measuremt	Electronic Measuremt	EMS 80-30-2-D-10T-1402	DC Power Supplies in Power Supplies LAMBDA ELECTRONIC MEASUREMENTS INC DC POWER SUPPLY 80V, 30A: DC Power Supply	1		1,450.00
	209846	Lambda	Lambda	ESS 160-62-2-D	DC Power Supplies in Power Supplies LAMBDA EMI DC POWER SUPPLY 160V, 62A: Direct Current Power Supply	1		3,250.00
	244847	Lambda	Lambda	ESS 20-250-2-D	DC Power Supplies in Power Supplies LAMBDA EMI DC POWER SUPPLY 20V, 250A: Direct Current Power Supply	2		1,850.00
	242600	Electronic Measuremt	Electronic Measuremt	EMS 40-25-2-D	DC Power Supplies in Power Supplies LAMBDA EMI DC POWER SUPPLY 40 V, 25 A: DC Power Supply Lambda/Electronic Measurement Inc. EMS 40-25	1
	242601	Electronic Measuremt	Electronic Measuremt	EMS 600-1.6-2D 1286	DC Power Supplies in Power Supplies LAMBDA EMI DC POWER SUPPLY 600 V, 1.6 A: DC Power Supply Lambda/Electronic Measurement Inc. EMS 600-1.6	2
	241958	Electronic Measuremt	Electronic Measuremt	EMS 7.5-300-2-D	DC Power Supplies in Power Supplies LAMBDA EMI DC POWER SUPPLY 7.5 V, 300 A: DC Power Supply Lambda/Electronic Measurement Inc. EMS 7.5-300	3		2,100.00
	234820	Lambda	Lambda	ESS 80-185-2-D-0969	DC Power Supplies in Power Supplies LAMBDA EMI DC POWER SUPPLY 80V, 185A: Direct Current Power Supply	1		3,450.00
	178848	Lambda	Lambda	ESS 80-185-7-D-0806	DC Power Supplies in Power Supplies LAMBDA EMI DC POWER SUPPLY 80V, 185A: Direct Current Power Supply	4		3,450.00
	105546	Electronic Measuremt	Electronic Measuremt	ESS 80-185-10-D-CE-1256	DC Power Supplies in Power Supplies LAMBDA EMI DC POWER SUPPLY 80V, 185A: Direct Current Power Supply	1		3,450.00	F*
	245226	Leatherwood Plastics	Leatherwood Plastics	LPAC100.SS.X	Solvent Wet Stations in Wafer Cleaners LEATHERWOOD PLASTICS 6' SOLVENT BENCH REAR EXHAUST:  With Fire Suppression System by Mark Systems	1
	36660	Leybold	Leybold	LAB 600 EB	Electron Beam Evaporators in Evaporation Tools LEYBOLD E-BEAM EVAPORATOR, 4 POCKET: E-Beam Evaporator with Ion Source	1			F*
	151338	Logitech	Logitech	BC1	Wafer Fabrication Equipment - Other in Wafer Fabrication Equipment LOGITECH WAFER BONDER CONTROLLER: Wafer Bonder Controller	1
	85387	Lufran	Lufran	SB5-403-A11	Wet Process Equipment - Other in Wet Processing Equipment LUFRAN PROCESS TANK/HEATER/PROCESS CONTROLLER: Process Tank/Heater/Process Controller Compatible with sulphuric, nitric or acetic acids, various strippers even KOH and HF.	2		3,000.00
	103541	MA Lighting Technolo	MA Lighting Technolo	12 X 3.7kW	Power Supplies - Other in Power Supplies MA LIGHTING TECHNOLOGY DIGITAL LIGHT DIMMER: Digital Light Dimmer	2			F*
	85226	MAGNETRON HEAD PK 90	MAGNETRON HEAD PK 90		Electron Beam Evaporators in Evaporation Tools MAGNETRON HEAD PK 90: Magnetron Head	1
	140569	MAGNETRON SPUTTERING CATHODE 6" x 40"	MAGNETRON SPUTTERING CATHODE 6" x 40"		Electron Beam Evaporators in Evaporation Tools MAGNETRON SPUTTERING CATHODE 6" x 40": Magnetron Sputtering Cathode Manufacturer Unknown	1			F*
	92507	MAGNETRON SPUTTERING CATHODE, 6"	MAGNETRON SPUTTERING CATHODE, 6"		Electron Beam Evaporators in Evaporation Tools MAGNETRON SPUTTERING CATHODE, 6": Magnetron Sputtering Cathode Manufacturer unknown	4
	108528	March Instruments	March Instruments	PM-600	Barrel/Box Plasma Etchers in Plasma Etch Equipment MARCH INSTRUMENTS BARREL PLASMA ETCHER 300 WATT: Barrel Plasma Etcher with Vacuum Pump March Instruments, manufacturer of plasma systems, was acquired by Nordson - called Nordson MARCH.	1			F*
	51482	March Instruments	March Instruments	SUPERPLASMOD	Barrel Resist Strippers in Plasma Resist Strippers MARCH INSTRUMENTS PLASMA CLEANER: Plasma Cleaner with 300W Power Supply	2			F*
	177136	March Instruments	March Instruments	PX-2400	Barrel/Box Plasma Etchers in Plasma Etch Equipment MARCH NORDSON BOX PLASMA ETCHER 1000 WATT 13.56 MHz: Box Plasma Etcher Applications "Gas plasma treatment provides a fast, efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. Plasma processing enhances lamination bondstrength, improves wire bond strength and uniformity,promotes underfill adhesion and enhances die attach." Source -- March Nordson.	1
	199963	March Instruments	March Instruments	PX-500	Barrel/Box Plasma Etchers in Plasma Etch Equipment MARCH NORDSON BOX PLASMA ETCHER 600 WATT 13.56 MHZ: Box Plasma Etcher	1			F*
	100429	Materials Technology	Materials Technology	02-01808	Epitaxial Cluster Tools in Epitaxial Reactors MATERIALS TECHNOLOGY CORPORATION BARREL SUSCEPTOR: EPI 3 1/4" Barrel Susceptor MTC EPI Reactor Parts For 3 Inch Wafers	4			F*
	202650	MDC	MDC	600-4T	Physical Vapor Deposition Equipment - Other in Physical Vapor Deposition Equipment MDC VACUUM CHAMBER FOUR WAY CROSS 8" CONFLAT: UHV Conflat Connections	1		2,850.00	F*
	81174	Melles Griot	Melles Griot	06 DAL 203	Helium-Neon Lasers in Lasers MELLES GRIOT ALIGNMENT LASER DIODE: Alignment Laser Diode	1		198.00	F*
	59142	Metroline	Metroline	M4L	Barrel Resist Strippers in Plasma Resist Strippers METROLINE BOX PLASMA ETCHER: Box Plasma Etcher	1			F*
	151502	Mill Lane Eng	Mill Lane Eng	Custom Research	Horizontal Sputterers in Batch Sputtering Tools MILL LANE DUAL CHAMBER RESEARCH SPUTTERING SYSTEM: Dual Chamber Research Sputtering System	1			F*
	1973	Mill Lane Eng	Mill Lane Eng	4123	Standalone Sputterers in Single Wafer Sputtering Tools MILL LANE ENGINEERING REEL COATER : Reel Coater for Ribbon or Wire The model 412-3 is a two-chamber reel to reel web coater which deposits metal or alloys on wire or ribbon substrates by sputtering from two magnetron targets arranged in a closely spaced book array. Capacity is based upon 4" ID x 12" OD x 3" wide wire/ribbon spools. Wire diameter up to 0.035" (.9mm) may be coated at speeds ranging between 2 and 40 feet per minute depending on the coating thickness desired. Constant wire speed and tension are controlled in conjunction with other parameters which enable unattended operation for extended periods. A second chamber provides plasma pre cleaning prior to entering the sputter zone through a conductance limiting tube which allows different gas compositions and pressures for cleaning and coating.	1			F*
	172359	Modutek	Modutek	QA14-DA1	Wet Process Equipment - Other in Wet Processing Equipment MODUTEK MODUBATH CONSTANT TEMPERATURE QUARTZ BATH: Constant Temperature Bath with MicroTemp Series Process Controller QA Series	1		1,575.00
	4071	MRC	MRC	902	Standalone Sputterers in Single Wafer Sputtering Tools MRC IN-LINE SPUTTER ETCH SYSTEM: In-Line Sputter-Etch System	1			F*
	143041	National Electronic	National Electronic	MH3.OW-SL	Radio Frequency (RF) Generators in Power Supplies NATIONAL ELECTRONICS/RICHARDSON MICROWAVE MAGNETRON HEAD: Microwave Magnetron Head	2
	11074	Nexx Systems	Nexx Systems	Cirrus 300	Single Chamber PECVD Tools in Production Tools NEXX SYSTEMS ECR PECVD RIE SYSTEM: Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex This system is designed for the fluorination of DLC surfaces on various substrates. The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy. High magnetic field launch produces a highly stable and efficient ECR plasma. Nexx Systems Cirrus 300	1			F*
	242093	Osiris International	Osiris International	DEFIXX 15m	Wafer Fabrication Equipment - Other in Wafer Fabrication Equipment OSIRIS INTERNATIONAL MANUAL WAFER DEBONDING TOOL: Manual Wafer Debonding Tool	1			F*
	181540	Oxford Instruments	Oxford Instruments	Plasmalab System 100	Single Chamber PECVD Tools in Production Tools OXFORD INSTRUMENTS PLASMALAB 100 PECVD: PECVD TEOS Tool with Load Lock NB: System needs a computer-software upgrade.  Selling this system AS IS, WHERE IS.	1			F*
	208462	Plasma-finish	Plasma-finish	V15G	Barrel/Box Plasma Etchers in Plasma Etch Equipment PLASMA-FINISH GMBH PLASMA ETCHER SYSTEM 300 WATT: Plasma Box Etcher System PINK GmbH acquired Plasma-Finish - now called PINK GmbH Plasma-Finish	1
	3011	Plasma-Therm	Plasma-Therm	Wafer Batch 740/740	Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM DUAL PLASMA ETCH AND REACTIVE ION ETCH SYSTEM 200MM: Dual Plasma Etch and Reactive Ion Etch Processing Systems System consists of a process chamber, upper electrode (with gas feed), and substrate electrode.	1
	4054	Plasma-Therm	Plasma-Therm	73/74	Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM PECVD AND DUAL PLASMA ETCH/REACTIVE ION ETCH SYSTEM: Combination PECVD and Dual Plasma Etch/Reactive Ion Etch Processing Systems	1
	50854	Plasma-Therm	Plasma-Therm	VII 734	Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM PLASMA DEPOSITION SYSTEM/RIE: Combination Plasma Deposition System/RIE	1			F*
	11919	Plasma-Therm	Plasma-Therm	VII 734MF	Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM REACTIVE ION ETCH/PLASMA ETCH SYSTEM: Plasmatherm RIE/Plasma Etch System	1			F*
	206582	Plasma-Therm	Plasma-Therm	BT 6" RIE MF	Metal Etchers in Single Chamber Plasma Tools PLASMATHERM BatchTop VII REACTIVE ION ETCH SYSTEM 6": Reactive Ion Etch System BatchTop VII	1
	45428	Plasma-Therm	Plasma-Therm	790 ICP	Poly/Nitride Etchers in Single Chamber Plasma Tools PLASMATHERM ICP PLASMA ETCHER: Inductively Coupled Plasma Etcher with 9.5 Inch Electrode	1			F*
	147470	Plasma-Therm	Plasma-Therm	790 PECVD 11"	Single Chamber PECVD Tools in Production Tools PLASMATHERM PECVD 790: Refurbished PECVD System with 11" Electrode	1			F*
	124315	Plasma-Therm	Plasma-Therm	790 11" RIE	Metal Etchers in Single Chamber Plasma Tools PLASMATHERM REACTIVE ION ETCH SYSTEM 11": Reactive Ion Etch System - 11" Electrode	1			F*
	45430	Plasma-Therm	Plasma-Therm	790 11 RIE	Metal Etchers in Single Chamber Plasma Tools PLASMATHERM REACTIVE ION ETCH SYSTEM 200MM: Reactive Ion Etch System 11" Electrode	1
	201152	Plasma-Therm	Plasma-Therm	790 RIE PECVD 11"	Etchers - Other in Single Chamber Plasma Tools PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX: Reactive Ion Etch / PECVD system mounted in glovebox with an intregrated air purfier O2 and H20 sensors on board. Both top and bottom electrodes can be powered sequentially.	1
	142821	Plasma-Therm	Plasma-Therm	Unaxis 790	Etchers - Other in Single Chamber Plasma Tools PLASMATHERM UNAXIS DUAL CHAMBER SHUTTLE LOAD LOCK SYSTEM: Shuttle Load Lock System	1
	30246	Plasma-Therm	Plasma-Therm	VLR 700 VLR-PM1-ICRB-PM	Cluster PECVD Tools in Production Tools PLASMATHERM VLR 700: Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes.	1			F*
	223090	CBI	CBI	2X2LOTO15	Physical Vapor Deposition Equipment - Other in Physical Vapor Deposition Equipment Pneumatic Lockout Tagout Box - 15 Channel: Custom fabricated assembly designed to be installed into a raised floor system.	10
	140735	Power Ten Inc	Power Ten Inc	P62B-8250	DC Power Supplies in Power Supplies POWER TEN DIRECT CURRENT POWER SUPPLY 8 V, 250 A: Direct Current Power Supply Acquired by Elgar Electronics Corporation	1		1,730.00
	83028	Power Ten Inc	Power Ten Inc	P63C-15220AB	DC Power Supplies in Power Supplies POWER TEN INC. DC POWER SUPPLY 15V, 220A: Direct Current Power Supply Acquired by Elgar Electronics Corporation	1		1,750.00
	39613	Power Ten Inc	Power Ten Inc	P62B-20150	DC Power Supplies in Power Supplies POWER TEN INC. DC POWER SUPPLY 20V, 150A: Direct Current Power Supply Acquired by Elgar Electronics Corporation	1		1,585.00
	83027	Power Ten Inc	Power Ten Inc	P62B-5325AB	DC Power Supplies in Power Supplies POWER TEN INC. DC POWER SUPPLY 5V, 325A: Direct Current Power Supply Acquired by Elgar Electronics Corporation	2		1,450.00
	242605	Power Ten Inc	Power Ten Inc	P66C-60330AB	DC Power Supplies in Power Supplies POWER TEN INC. DC POWER SUPPLY 60V, 330A: Direct Current Power Supply Acquired by Elgar Electronics Corporation	1
	102308	Power Ten Inc	Power Ten Inc	4500C-6040	DC Power Supplies in Power Supplies POWER TEN INC. DC POWER SUPPLY 60V, 40A: Direct Current Power Supply Acquired by Elgar Electronics Corporation	2
	230353	Advanced Energy	Advanced Energy	B0111-DPXX-105-XX	Radio Frequency (RF) Generators in Power Supplies Profibus communication board for Advanced Energy CESAR generators: Profibus communication board for Advanced Energy CESAR generators	5
	160264	Quintel	Quintel	Q-804	Contact/Proximity Mask Aligners in Mask Aligners QUINTEL MASK ALIGNER/EXPOSURE SYSTEM: Mask Aligner/Exposure System	1			F*
	24564	Quintel	Quintel	UL 7000 IR	Contact/Proximity Mask Aligners in Mask Aligners QUINTEL-NEUTRONIX MASK ALIGNER 200 MM: Mask Aligner with IR Backside Alignment Quintel acquired by Neutronix	1			F*
	187522	Reynoldstech	Reynoldstech	Custom	Wafer Fabrication Equipment - Other in Wafer Fabrication Equipment REYNOLDSTECH 16 'X 16', HOT PLATE 200° C, : 200° C 16 " x 16" Hot Plate with Vacuum Hold Down	1		5,750.00
	181396	Reynoldstech	Reynoldstech	Resist Develop Station	Acid Wet Stations in Wafer Cleaners REYNOLDSTECH PHOTORESIST DEVELOP HOOD: Photoresist Develop Station with Headway Wafer Spin Cleaner	1			F*
	191060	SemiSoft Inc.	SemiSoft Inc.	MProbe VIS20 In-situ	Physical Vapor Deposition Equipment - Other in Physical Vapor Deposition Equipment SEMICONSOFT THIN FILM MEASUREMENT SYSTEM VIS: Thin Film Measurement System The MProbe 20VIS is a desktop thin-film thickness measurement system. The measurement is based on spectroscopic reflectance and uses fiber optics retro-reflecting probe.	1
Displaying 101-200 of 284  Page    1  2  3

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Wafer Fabrication Equipment: AB-M Inc., Absopulse Electronics Ltd., Accel, Advanced Energy, Advanced Plasma System, Inc., Agilent Technologies, AIO Microservice, Airco Temescal, Alpha Scientific Electronics, Applied Materials AKT, Applied Materials, Inc., Astex, Asyst Technologies, Balzers, Bold Technologies, Branson/IPC, Brewer Science, Brooks Automation, Bruker, Canary Technology, Carbone, CBI, CHA Industries, Comdel, Con Optics, Copley Controls Corp., CPI, Daihen, Dockweiler Chemicals, Electronic Measurements Inc, Elgar, ENI Power Systems, Equipe Technologies, EVG, Hamatech, Headway, Heraeus, Hewlett Packard, Imtec Acculine, Inficon, Interlab, ITEC Powertron, Japan Radio Co., Karl Suss, Kaufman & Robinson Inc., Keyence, LAM Research Corp., Lambda, Leatherwood Plastics, Leybold, Logitech, Lufran, MA Lighting Technolo, March Instruments, Materials Research Corp, Materials Technology, MDC, Melles Griot, Metroline, Mill Lane Engineering, Modutek, National Electronic, Nexx Systems, Osiris International GmbH, Oxford Instruments, Plasma-finish Enterprise, Plasma-Therm, Power Ten Inc, Quintel, Reynoldstech, Semi-Tool, SemiSoft Inc., Semitool, Seren, Sharon Vacuum , Silicon Valley Group, Solitec, Sorensen, Specialty Coating Systems, SPI Supplies, Stackpole, Surface Technology Systems, Suss MicroTec, TDK-Lambda, Technics, Telemark, Temescal, Tepla, Trek Inc, Trion Technology, Ulvac, Varian, Verteq, Walker Scientific , Yaskawa Electric Cor, Yield Engineering Systems, Zircar