|
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Make |
Model |
|
|
$ |
|
|
1798
|
Accel
|
Accel |
MICROCEL II |
in Wet Processing Equipment
ACCEL CORP. SEMI-AUTOMATIC CENTRIFUGAL CLEANING SYSTEM:Semi-Automatic Centrifugal Cleaning System
Used for cleaning electronic assemblies Three step process.: Washing, rinsing, drying - Circuit assemblies
- Precision parts
- Medical devices
- Bumper wafers
- Flip chips , MCMs, BGAs, and hybrid circuits
No drain or waste water treatment required Automatic recovery of solvents from waste water Four stage water purification process
|
1
|
|
|
|
|
|
3882
|
Bold Technologies
|
Bold Technologies |
N/A |
in Wafer Cleaners
BOLD TECHNOLOGIES SEMI-AUTOMATED ACID WET BENCH SYSTEM:Semi-Automated Acid Wet Bench System
|
1
|
|
|
F* |
|
|
43636
|
Hamatech
|
Hamatech |
104180 |
in Spray/Brush Scrubbers
HAMATECH AUTOMATIC SUBSTRATE CLEANER:Automatic Substrate Cleaner
|
1
|
|
|
F* |
|
|
206648
|
Imtec Acculine
|
Imtec Acculine |
QZ-A1502 |
in Wet Processing Equipment
IMTEC ACCUBATH CONSTANT TEMPERATURE QUARTZ BATH:Constant Temperature Bath
|
1
|
|
1,575.00 |
F* |
|
|
206630
|
Imtec Acculine
|
Imtec Acculine |
QRT/S-A1502 |
in Wet Processing Equipment
IMTEC ACCUBATH QUARTZ PROCESS BATH:Recirculating Quartz Bath
|
1
|
|
1,850.00 |
|
|
|
160726
|
Interlab
|
Interlab |
MRS1583 |
in Wafer Cleaners
INTERLAB MICRO RINSE SYSTEM:Micro Rinse System
|
1
|
|
|
|
|
|
245226
|
Leatherwood Plastics
|
Leatherwood Plastics |
LPAC100.SS.X |
in Wafer Cleaners
LEATHERWOOD PLASTICS 6' SOLVENT BENCH REAR EXHAUST: With Fire Suppression System by Mark Systems
|
1
|
|
|
|
|
|
85387
|
Lufran
|
Lufran |
SB5-403-A11 |
in Wet Processing Equipment
LUFRAN PROCESS TANK/HEATER/PROCESS CONTROLLER:Process Tank/Heater/Process Controller
Compatible with sulphuric, nitric or acetic acids, various strippers even KOH and HF.
|
2
|
|
3,000.00 |
|
|
|
172359
|
Modutek
|
Modutek |
QA14-DA1 |
in Wet Processing Equipment
MODUTEK MODUBATH CONSTANT TEMPERATURE QUARTZ BATH:Constant Temperature Bath with MicroTemp Series Process Controller
QA Series
|
1
|
|
1,575.00 |
|
|
|
181396
|
Reynoldstech
|
Reynoldstech |
Resist Develop Station |
in Wafer Cleaners
REYNOLDSTECH PHOTORESIST DEVELOP HOOD:Photoresist Develop Station with Headway Wafer Spin Cleaner
|
1
|
|
|
F* |
|
|
186319
|
Semitool
|
Semitool |
ST-260D |
in Wafer Cleaners
SEMITOOL RHETECH SPIN RINSE DRYER:Single Stack Table Top Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
188065
|
Semitool
|
Semitool |
ST-240D |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER :Dual Stack Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
135639
|
Semitool
|
Semitool |
4600L-5-2-E-VT |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER 380 MM:Large Area Substrate Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
134446
|
Semitool
|
Semitool |
ST-240D |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER 75 MM:Dual Stack Table Top Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
170192
|
Semitool
|
Semitool |
ST-840 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 100MM:Spin Rinse Dryer up to 100mm
|
3
|
|
|
F* |
|
|
170195
|
Semitool
|
Semitool |
ST-860 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM:Spin Rinse Dryer up to 125mm Built in Resistivity Monitor
|
1
|
|
|
F* |
|
|
170196
|
Semitool
|
Semitool |
ST-860 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM:Spin Rinse Dryer up to 125mm
|
1
|
|
|
|
|
|
170197
|
Semitool
|
Semitool |
ST-460 SRD |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER UP TO 125MM:Spin Rinse Dryer up to 125mm
Built in Resistivity Monitor
|
1
|
|
|
F* |
|
|
135159
|
Semi-Tool
|
Semi-Tool |
WST 306 MG |
in Wet Processing Equipment
SEMITOOL SPRAY SOLVENT TOOL:Spray Solvent Tool
Rhetech Semitool WST 306 MG
|
1
|
|
|
|
|
|
7358
|
Semi-Tool
|
Semi-Tool |
WST 406 MG |
in Wet Processing Equipment
SEMITOOL SPRAY SOLVENT TOOL:Spray Solvent Tool Refurbished by Rhetech in 2000
Photoresist develop/strip, polymer removal, pre-metal deposition cleaning. High speed rinse and dry of wafers, with low particle counts and reduced DI water consumption.
|
2
|
|
|
F* |
|
|
223579
|
Semitool
|
Semitool |
SRD Rotors |
in Wafer Cleaners
SEMITOOL VERTEQ SRD ROTORS:Various Rotors from Semitool and Verteq. Part numbers and quantities are below.
|
1
|
|
|
|
|
|
159909
|
Semitool
|
Semitool |
ST 440S |
in Wafer Cleaners
SEMITOOL/RHETECH SPIN RINSE DRYER 100 MM:Spin Rinse Dryer up to 100mm
|
1
|
|
|
F* |
|
|
8999
|
Semitool
|
Semitool |
ST 460S |
in Wafer Cleaners
SEMITOOL/RHETECH SPIN RINSE DRYER 150 MM ST 460S:Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
38830
|
SRD ROTORS
|
SRD ROTORS |
in Wafer Cleaners
|
19
|
|
|
|
|
|
5475
|
Verteq
|
Verteq |
1600-55M |
in Wafer Cleaners
VERTEQ DUAL STACK SPIN RINSE DRYERS:Dual Stack Spin Rinse Dryers
|
2
|
|
|
F* |
|
|
28697
|
Verteq
|
Verteq |
IPA 2800 |
in Wafer Cleaners
VERTEQ IPA VAPOR DRYER 200 MM:IPA Vapor Dryer
IPA 2800 is a drying system using isopropyl alcohol to provide a clean,dry surface on wafers and substrates System features a class 10 elevator,ultra-pure nitrogen loading environment, short load-to-vapor time and fast recovery between cycles The system is partical netural at 0.2 microns
This system is NOT a marangoni style
|
1
|
|
|
F* |
|
|
20103
|
Verteq
|
Verteq |
1600-55-A |
in Wafer Cleaners
VERTEQ SUPERCLEAN SPIN RINSE DRYER:Spin Rinse Dryer
|
1
|
|
|
|
|