|
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Make |
Model |
|
|
$ |
|
|
228193
|
AMAT AKT
|
AMAT AKT |
AKT 15 K |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AKT GEN 5 PECVD CHAMBER:Chambers are unused and were never commissioned. Susceptor, gas shower and other chamber kitting not included.
|
5
|
|
|
F* |
|
|
228194
|
AMAT AKT
|
AMAT AKT |
AKT 25 K |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AKT GEN 6 PECVD CHAMBER:Chambers are unused and were never commissioned. Susceptor, gas shower and other chamber kitting are not installed.
|
5
|
|
|
F* |
|
|
229902
|
AMAT AKT
|
AMAT AKT |
0690-01681 |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200:CLAMP FLG SGL-CLAW NW160,200 Item is in new condition sealed in its original packing. Browse our large inventory of Applied Materials AKT PECVD GEN 5 & GEN 6 Parts. Including 25K/15K Process Chambers, Susceptors, Chamber Liners, Kitting and much more. Check out our full list here: Applied Materials AKT PECVD New/Used Surplus Parts List
|
1
|
|
|
|
|
|
229925
|
APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200
|
APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200 |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT 0690-01681 CLAMP FLG SGL-CLAW NW160,200:CLAMP FLG SGL-CLAW NW160,200 Item is in new condition sealed in its original packing. Browse our large inventory of Applied Materials AKT PECVD GEN 5 & GEN 6 Parts. Including 25K/15K Process Chambers, Susceptors, Chamber Liners, Kitting and much more. Check out our full list here: Applied Materials AKT PECVD New/Used Surplus Parts List
|
1
|
|
|
|
|
|
228262
|
AMAT AKT
|
AMAT AKT |
N/A |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT AKT FIXTURE DIFFUSER LIFTING 25KAXI:FIXTURE DIFFUSER LIFTING 25KAXI New surplus - item is brand new, in OEM crate. Photo of crates is a representative photo.
|
2
|
|
|
F* |
|
|
228247
|
AMAT AKT
|
AMAT AKT |
0244-74553 REV.2 |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT AKT GEN 5 15K SUSCEPTOR: KIT SUSC FSW 1/4 CEN GTP SS 1200X1600 15 New surplus - item is brand new, in OEM crate. Photo of crates is a representative photo.
|
2
|
|
|
|
|
|
228260
|
AMAT AKT
|
AMAT AKT |
0244-74553 |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT AKT GEN 5 15K SUSCEPTOR:KIT SUSC FSW 1/4 CEN GTP SS 1200X1600 15 New surplus - item is brand new, in OEM crate. Photo of crates is a representative photo.
|
2
|
|
|
F* |
|
|
228261
|
AMAT AKT
|
AMAT AKT |
0244-74554 REV.3 |
in Chemical Vapor Deposition Equipment
APPLIED MATERIALS AMAT AKT GEN 6 25K SUSCEPTOR:KIT SUSC FSW 1500X1850 W/O BSHING New surplus - item is brand new, in OEM crate. Photo of crates is a representative photo.
|
2
|
|
|
|
|
|
225959
|
Applied Materials
|
Applied Materials |
|
in Chemical Vapor Deposition Equipment
|
1
|
|
|
|
|
|
98056
|
Carbone
|
Carbone |
G-III |
in Epitaxial Reactors
CARBONE SILICON CARBIDE 200mm DISC SUSCEPTOR:Silicon Carbide 200 mm Disc Susceptor
Carbone of America Part number 017893-001
|
5
|
|
|
F* |
|
|
207176
|
Dockweiler Chemicals
|
Dockweiler Chemicals |
8000 |
in Chemical Vapor Deposition Equipment
DOCKWEILER CHEMICALS HEAT EXCHANGER FOR BUBBLERS:Bubbler Heat Exchanger
|
1
|
|
|
|
|
|
207177
|
Dockweiler Chemicals
|
Dockweiler Chemicals |
20000 |
in Chemical Vapor Deposition Equipment
DOCKWEILER CHEMICALS HEAT EXCHANGER FOR BUBBLERS:Bubbler Heat Exchanger
|
1
|
|
|
|
|
|
100429
|
Materials Technology
|
Materials Technology |
02-01808 |
in Epitaxial Reactors
MATERIALS TECHNOLOGY CORPORATION BARREL SUSCEPTOR:EPI 3 1/4" Barrel Susceptor
MTC EPI Reactor Parts For 3 Inch Wafers
|
4
|
|
|
F* |
|
|
11074
|
Nexx Systems
|
Nexx Systems |
Cirrus 300 |
in Production Tools
NEXX SYSTEMS ECR PECVD RIE SYSTEM:Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex
This system is designed for the fluorination of DLC surfaces on various substrates. The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy. High magnetic field launch produces a highly stable and efficient ECR plasma. Nexx Systems Cirrus 300
|
1
|
|
|
F* |
|
|
181540
|
Oxford Instruments
|
Oxford Instruments |
Plasmalab System 100 |
in Production Tools
OXFORD INSTRUMENTS PLASMALAB 100 PECVD:PECVD TEOS Tool with Load Lock
NB: System needs a computer-software upgrade. Selling this system AS IS, WHERE IS.
|
1
|
|
|
F* |
|
|
147470
|
Plasma-Therm
|
Plasma-Therm |
790 PECVD 11" |
in Production Tools
PLASMATHERM PECVD 790:Refurbished PECVD System with 11" Electrode
|
1
|
|
|
F* |
|
|
30246
|
Plasma-Therm
|
Plasma-Therm |
VLR 700 VLR-PM1-ICRB-PM |
in Production Tools
PLASMATHERM VLR 700:Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes.
|
1
|
|
|
F* |
|