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	View All Offers Under Parallel Plasma Tools » Switch Major Category		Click an item's ID# below for its full specifications , or: Group Offers into sub-categories under Parallel Plasma Tools List all 12 product types under Parallel Plasma Tools

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Item ID  Photo Short Description Product Type / Details # Price Notes Make Model   $   87948 Applied Materials   Applied Materials   8300  Oxide Etchers in Single Chamber Plasma Tools APPLIED MATERIALS CONTROLLER: Controller 1   87949 Applied Materials   Applied Materials   8300  Oxide Etchers in Single Chamber Plasma Tools APPLIED MATERIALS SYSTEM ELECTRONICS RACK: System Electronics Rack 1   34890 LAM Research Co   LAM Research Co   490 AUTO ETCH  Poly/Nitride Etchers in Single Chamber Plasma Tools LAM RESEARCH SIX INCH NITRIDE ETCHER: Six Inch Nitride Etcher Automated Cassette to Cassette single wafer etching. 1   F* 3011 Plasma-Therm   Plasma-Therm   Wafer Batch 740/740  Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM DUAL PLASMA ETCH AND REACTIVE ION ETCH SYSTEM 200MM: Dual Plasma Etch and Reactive Ion Etch Processing Systems System consists of a process chamber, upper electrode (with gas feed), and substrate electrode.   1   4054 Plasma-Therm   Plasma-Therm   73/74  Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM PECVD AND DUAL PLASMA ETCH/REACTIVE ION ETCH SYSTEM: Combination PECVD and Dual Plasma Etch/Reactive Ion Etch Processing Systems 1   50854 Plasma-Therm   Plasma-Therm   VII 734  Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM PLASMA DEPOSITION SYSTEM/RIE: Combination Plasma Deposition System/RIE 1   F* 11919 Plasma-Therm   Plasma-Therm   VII 734MF  Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM REACTIVE ION ETCH/PLASMA ETCH SYSTEM: Plasmatherm RIE/Plasma Etch System 1   F* 206582 Plasma-Therm   Plasma-Therm   BT 6" RIE MF  Metal Etchers in Single Chamber Plasma Tools PLASMATHERM BatchTop VII REACTIVE ION ETCH SYSTEM 6": Reactive Ion Etch System BatchTop VII 1   45428 Plasma-Therm   Plasma-Therm   790 ICP  Poly/Nitride Etchers in Single Chamber Plasma Tools PLASMATHERM ICP PLASMA ETCHER: Inductively Coupled Plasma Etcher with 9.5 Inch Electrode 1   F* 124315 Plasma-Therm   Plasma-Therm   790 11" RIE  Metal Etchers in Single Chamber Plasma Tools PLASMATHERM REACTIVE ION ETCH SYSTEM 11": Reactive Ion Etch System - 11" Electrode 1   F* 45430 Plasma-Therm   Plasma-Therm   790 11 RIE  Metal Etchers in Single Chamber Plasma Tools PLASMATHERM REACTIVE ION ETCH SYSTEM 200MM: Reactive Ion Etch System 11" Electrode 1   201152 Plasma-Therm   Plasma-Therm   790 RIE PECVD 11"  Etchers - Other in Single Chamber Plasma Tools PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX: Reactive Ion Etch / PECVD system mounted in glovebox with an intregrated air purfier O2 and H20 sensors on board. Both top and bottom electrodes can be powered sequentially. 1   142821 Plasma-Therm   Plasma-Therm   Unaxis 790  Etchers - Other in Single Chamber Plasma Tools PLASMATHERM UNAXIS DUAL CHAMBER SHUTTLE LOAD LOCK SYSTEM: Shuttle Load Lock System 1   147500 Surface Tech Sys   Surface Tech Sys   MXP Multiplex ICP HR  Etchers - Other in Single Chamber Plasma Tools SURFACE TECHNOLOGY SYSTEMS MXP ICP HR: Chlorine Etcher - Year 2003 1   102178 Surface Tech Sys   Surface Tech Sys   MXP Multiplex ICP ASE HR  Silicon Etchers in Single Chamber Plasma Tools SURFACE TECHNOLOGY SYSTEMS STS SILICON ICP ETCHER: Silicon Etcher - Year 2003 1   184779 Technics   Technics   Micro Stripper -- Series 200  Metal Etchers in Single Chamber Plasma Tools TECHNICS PLASMA ETCHER 200 WATT 13.65 MHz: Technics Micro Stripper Series 200 Plasma System 1   F* 119294 Trion Technology   Trion Technology   Oracle  Cluster Plasma Tools - Oxide in Cluster Plasma Tools TRION TECHNOLOGY DIELECTRIC CLUSTER TOOL: Dielectric Cluster Tool Trion Technology Oracle 1   F* 126704 Ulvac   Ulvac   NE 7800 Ferroelectric Etcher  Cluster Plasma Tools - Metal in Cluster Plasma Tools ULVAC FERROELECTRIC ETCHER: Like New Condition System installed in October of 2007, decommission in Feburary of 2008. Used in a R&D application The Ulvac NE 7800 is a high-temperature, high-density plasma etching system utilizing an Inductive Super Magnetron source (ICP with magnetic field). The NE 7800 is a dual load locked, cassette to cassette system designed for both R&D and production applications. Outstanding metal etching process stability for Pt/Ir/magnetic films and difficult to etch materials such as FeRAM and MRAM devices.   1   F*

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
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   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Parallel Plasma Tools: Applied Materials, Inc., LAM Research Corp., Plasma-Therm, Surface Technology Systems, Technics, Trion Technology, Ulvac