Other Information | Features:
- Semiautomatic operation, fully programmable
- Touchscreen LCD panel
- Microprocessor control, ensures precise, flexible, uniform, and repeatable cleaning
- Store 10 programs, each with up to 99 different clean/rinse/dry steps, with 999 seconds maximum per step
- Non-volatile memory for program storage
- Accommodates up to 6" diameter wafers mounted on a film frame or grip ring
- Interchangeable chuck capability
- Both hot and cool dry modes available
- Standard wafer/wafer carrier chuck with vacuum hold (specify wafer/wafer carrier size)
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