Robotic PR Coater Tracks
BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM
Programmable Automated Coat/Bake Track System
Lithography Tools
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Automated Coating and Developing Cluster System
SUSS MICROTEC FALCON ACS 200
Fully Automated High Throughput Coating, Developing Cluster System System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
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Mask Aligners: Contact/Proximity
KARL SUSS MANUAL MASK ALIGNER 150 MM
Manual Mask Aligner The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.
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Mask Aligners: Contact/Proximity
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM
Mask Aligner with IR Backside Alignment Quintel acquired by Neutronix
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Robotic PR Coater Tracks
AIO MICROSERVICE DUAL TRACK COAT SYSTEM
Dual Track Coat System
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Manual Photoresist Coaters
HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER
Manual Photoresist Spin Coater
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Manual Photoresist Coaters
BLE RESPECT AUTOMATIC PHOTORESIST COATER
Automatic Photoresist Coater System is designed exclusively to coat and bake substrates using spinning and heating techniques.
BLE was acquired by Suss Microtec
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Manual Photoresist Developers
BLE RESPECT AUTOMATIC PHOTORESIST DEVELOPER
System is designed exclusively to develop and bake substrates using spinning and heating techniques
BLE was acquired by Suss Microtec
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Mask Aligners: Contact/Proximity
QUINTEL MASK ALIGNER/EXPOSURE SYSTEM
Mask Aligner/Exposure System
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Manual Photoresist Developers
SOLITEC SCRUBBER/HI PRESSURE SPRAY
Scrubber/Hi Pressure Spray
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Standard Photoresist DevTracks
SOLITEC AUTOMATIC TWO-STATION PHOTORESIST COAT & BAKE
Automatic Two-station Photoresist Coat & Bake Designed to coat and soft bake semiconductor wafers.
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Other Lithography Equipment
AB-M INC. IR WAFER ALIGNER STATION
IR Wafer Aligner Station