Robotic PR Coater Tracks
AIO MICROSERVICE DUAL TRACK COAT SYSTEM
Dual Track Coat System
Robotic PR Coater Tracks
Dual Track Coat System
Robotic PR Coater Tracks
Manual Photoresist Coaters
Automatic Photoresist Coater System is designed exclusively to coat and bake substrates using spinning and heating techniques.
BLE was acquired by Suss Microtec
Manual Photoresist Developers
System is designed exclusively to develop and bake substrates using spinning and heating techniques
BLE was acquired by Suss Microtec
Automated Coating and Developing Cluster System
Fully Automated High Throughput Coating, Developing Cluster System System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
Manual Photoresist Coaters
Manual Photoresist Spin Coater
Mask Aligners: Contact/Proximity
Mask Aligner with IR Backside Alignment Quintel acquired by Neutronix
Manual Photoresist Developers
Scrubber/Hi Pressure Spray
Standard Photoresist DevTracks
Temperature Controlled Positive Developer with Hot Plate Bake Designed to develop and hard bake semiconductor wafers.
Standard Photoresist DevTracks
Automatic Two-station Photoresist Coat & Bake Designed to coat and soft bake semiconductor wafers.
Manual Photoresist Coaters
Spin Coater
Manual Photoresist Coaters
Dip Coater