Manual Mask Aligner The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.

Dual Track Coat System

Automatic Photoresist Coater  System is designed exclusively to coat and bake substrates using spinning and heating techniques.

BLE was acquired by Suss Microtec

System is designed exclusively to develop and bake substrates using spinning and heating techniques

BLE was acquired by Suss Microtec

Fully Automated High Throughput Coating, Developing Cluster System  System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.

Manual Photoresist Spin Coater

Mask Aligner with IR Backside Alignment Quintel acquired by Neutronix

Scrubber/Hi Pressure Spray

Temperature Controlled Positive Developer with Hot Plate Bake Designed to develop and hard bake semiconductor wafers.

Automatic Two-station Photoresist Coat & Bake Designed to coat and soft bake semiconductor wafers.

Spin Coater