Radio Frequency (RF) Generators
ENI POWER SYSTEMS RF GENERATOR 1250W, 13.56 MHZ
Radio Frequency Generator
Representative photo
Acquired by MKS Instruments
Radio Frequency (RF) Generators
Radio Frequency Generator
Representative photo
Acquired by MKS Instruments
Radio Frequency (RF) Generators
Radio Frequency Generator
Representative photo
PECVD TEOS Tool with Load Lock
NB: System needs a computer-software upgrade. Selling this system AS IS, WHERE IS.
Inductively Coupled Plasma Etcher with 9.5 Inch Electrode
Gridless End-Hall Ion Source With Water Cooled Front Plate
Six Pocket Ebeam Gun, (2)Resistance Sources, 6kW Heater Array, 25.5" Bell Jar, Cryo Pumped The CHA SEC-1000-RAP high-vacuum EBeam deposition system designed for use in production and research environments.
Load locked single wafer sputter, cassette to cassette vertically mounted for sideways sputter
Currently configured for 100mm wafers 3 Target mini-quantums RF Etch VIPS (Vacuum Isolated Processing Station) Residual Gas Analyzer
Mask Aligners: Contact/Proximity
Manual Mask Aligner
The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.
Programmable Automated Coat/Bake Track System
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