Wafer Fabrication Equipment

  1. CHA SEC 1000 RAP ELECTRON BEAM EVAPORATOR

    Electron Beam Evaporators

    CHA SEC 1000 RAP ELECTRON BEAM EVAPORATOR

    Six Pocket Ebeam Gun, (2)Resistance Sources, 6kW Heater Array, 25.5" Bell Jar, Cryo Pumped The CHA SEC-1000-RAP high-vacuum EBeam deposition system designed for use in production and research environments.

  2. VARIAN 3190 SPUTTER SYSTEM

    Standalone Sputterers

    VARIAN 3190 SPUTTER SYSTEM

    Load locked single wafer sputter, cassette to cassette vertically mounted for sideways sputter

    Currently configured for 100mm wafers 3 Target mini-quantums RF Etch VIPS (Vacuum Isolated Processing Station) Residual Gas Analyzer

  3. KARL SUSS MANUAL MASK ALIGNER 150 MM

    Mask Aligners: Contact/Proximity

    KARL SUSS MANUAL MASK ALIGNER 150 MM

    Manual Mask Aligner

    The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.