Wafer Fabrication Equipment
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OXFORD INSTRUMENTS PLASMALAB 100 PECVD
PECVD TEOS Tool with Load Lock
NB: System needs a computer-software upgrade. Selling this system AS IS, WHERE IS.
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Radio Frequency (RF) Generators
ADVANCED ENERGY RADIO FREQUENCY GENERATOR POWER SUPPLY, 10000 WATT, 40 KHZ
Radio Frequency Generator Representative photo
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Radio Frequency (RF) Generators
ENI POWER SYSTEMS RF GENERATOR 1250W, 13.56 MHZ
Radio Frequency Generator Acquired by MKS Instruments Representative photo
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PLASMATHERM ICP PLASMA ETCHER
Inductively Coupled Plasma Etcher with 9.5 Inch Electrode
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CHA SEC 1000 RAP ELECTRON BEAM EVAPORATOR
Six Pocket Ebeam Gun, (2)Resistance Sources, 6kW Heater Array, 25.5" Bell Jar, Cryo PumpedThe CHA SEC-1000-RAP high-vacuum EBeam deposition system designed for use in production and research environments.
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BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM
Programmable Automated Coat/Bake Track System -
VARIAN 3190 SPUTTER SYSTEM
Load locked single wafer sputter, cassette to cassette vertically mounted for sideways sputter Currently configured for 100mm wafers3 Target mini-quantumsRF EtchVIPS (Vacuum Isolated Processing Station)Residual Gas Analyzer
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KAUFMAN & ROBINSON END-HALL ION SOURCE WITH WATER COOLED FRONT PLATE
Gridless End-Hall Ion Source With Water Cooled Front Plate
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Automated Coating and Developing Cluster System
SUSS MICROTEC FALCON ACS 200
Fully Automated High Throughput Coating, Developing Cluster System System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
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