Programmable Automated Coat/Bake Track System

Fully Automated High Throughput Coating, Developing Cluster System  System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.

Manual Mask Aligner The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.

Mask Aligner with IR Backside Alignment Quintel acquired by Neutronix

Dual Track Coat System

Manual Photoresist Spin Coater

Automatic Photoresist Coater  System is designed exclusively to coat and bake substrates using spinning and heating techniques.

BLE was acquired by Suss Microtec

System is designed exclusively to develop and bake substrates using spinning and heating techniques

BLE was acquired by Suss Microtec

Mask Aligner/Exposure System

Automatic Two-station Photoresist Coat & Bake Designed to coat and soft bake semiconductor wafers.

Scrubber/Hi Pressure Spray

Single Track Hot Plate Oven Silicon Valley Group 8136