BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM
Programmable Automated Coat/Bake Track System
Lithography Tools
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Automated Coating and Developing Cluster System
SUSS MICROTEC FALCON ACS 200
Fully Automated High Throughput Coating, Developing Cluster System System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
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Mask Aligners: Contact/Proximity
KARL SUSS MANUAL MASK ALIGNER 150 MM
Manual Mask Aligner The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.
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Mask Aligners: Contact/Proximity
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM
Mask Aligner with IR Backside Alignment Quintel acquired by Neutronix
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HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER
Manual Photoresist Spin Coater
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BLE RESPECT AUTOMATIC PHOTORESIST COATER
Automatic Photoresist Coater System is designed exclusively to coat and bake substrates using spinning and heating techniques.
BLE was acquired by Suss Microtec
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BLE RESPECT AUTOMATIC PHOTORESIST DEVELOPER
System is designed exclusively to develop and bake substrates using spinning and heating techniques
BLE was acquired by Suss Microtec
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Standard Photoresist DevTracks
SOLITEC AUTOMATIC TWO-STATION PHOTORESIST COAT & BAKE
Automatic Two-station Photoresist Coat & Bake Designed to coat and soft bake semiconductor wafers.
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