Inductively Coupled Plasma Etcher with 9.5 Inch Electrode

Silicon Etcher - Year 2003

Plasma Treatment System Desmear/Etchback Advanced Plasma Systems and March Instruments, manufacturer of plasma systems, were aquired by Nordson. Both companies merged and are an entity of Nordson - now called Nordson MARCH.

Six Inch Nitride Etcher Automated Cassette to Cassette single wafer etching.

Reactive Ion Etch System

BatchTop VII

Box Plasma Etcher

Barrel Plasma Etcher with Vacuum PumpMarch Instruments, manufacturer of plasma systems, was acquired by Nordson - called Nordson MARCH.

Applications"Gas plasma treatment provides a fast, efficient method forsurface treatment and cleaning prior to wire bonding, dieattach, encapsulation, conformal coating and other processes.Plasma processing enhances lamination bondstrength, improves wire bond strength and uniformity,promotes underfill adhesion and enhances die attach." Source -- March Nordson.

Shuttle Load Lock System

Chlorine Etcher - Year 2003

Combination PECVD and Dual Plasma Etch/Reactive Ion Etch Processing Systems

Like New Condition System installed in October of 2007, decommission in Feburary of 2008. Used in a R&D application The Ulvac NE 7800 is a high-temperature, high-density plasma etching system utilizing an Inductive Super Magnetron source (ICP with magnetic field). The NE 7800 is a dual load locked, cassette to cassette system designed for both R&D and production applications. Outstanding metal etching process stability for Pt/Ir/magnetic films and difficult to etch materials such as FeRAM and MRAM devices.