Poly/Nitride Etchers
PLASMATHERM ICP PLASMA ETCHER
Inductively Coupled Plasma Etcher with 9.5 Inch Electrode
Plasma Etching Equipment
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Silicon Etchers
SURFACE TECHNOLOGY SYSTEMS STS SILICON ICP ETCHER
Silicon Etcher - Year 2003
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Barrel/Box Plasma Etchers
APS MARCH B SERIES-4 PLASMA TREATMENT SYSTEM.
Plasma Treatment System Desmear/Etchback Advanced Plasma Systems and March Instruments, manufacturer of plasma systems, were aquired by Nordson. Both companies merged and are an entity of Nordson - now called Nordson MARCH.
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Poly/Nitride Etchers
LAM RESEARCH SIX INCH NITRIDE ETCHER
Six Inch Nitride Etcher Automated Cassette to Cassette single wafer etching.
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Metal Etchers
PLASMATHERM BatchTop VII REACTIVE ION ETCH SYSTEM 6"
Reactive Ion Etch System
BatchTop VII
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Barrel/Box Plasma Etchers
MARCH NORDSON BOX PLASMA ETCHER 600 WATT 13.56 MHZ
Box Plasma Etcher
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Barrel/Box Plasma Etchers
MARCH INSTRUMENTS BARREL PLASMA ETCHER 300 WATT
Barrel Plasma Etcher with Vacuum PumpMarch Instruments, manufacturer of plasma systems, was acquired by Nordson - called Nordson MARCH.
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Barrel/Box Plasma Etchers
MARCH NORDSON BOX PLASMA ETCHER 1000 WATT 13.56 MHz
Box Plasma EtcherApplications"Gas plasma treatment provides a fast, efficient method forsurface treatment and cleaning prior to wire bonding, dieattach, encapsulation, conformal coating and other processes.Plasma processing enhances lamination bondstrength, improves wire bond strength and uniformity,promotes underfill adhesion and enhances die attach." Source -- March Nordson.
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Other Etchers
PLASMATHERM UNAXIS DUAL CHAMBER SHUTTLE LOAD LOCK SYSTEM
Shuttle Load Lock System
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Other Etchers
SURFACE TECHNOLOGY SYSTEMS MXP ICP HR
Chlorine Etcher - Year 2003
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Metal Etchers
PLASMA-THERM PECVD AND DUAL PLASMA ETCH/REACTIVE ION ETCH SYSTEM
Combination PECVD and Dual Plasma Etch/Reactive Ion Etch Processing Systems
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Cluster Plasma Tools - Metal
ULVAC DRY ETCHING SYSTEM
Like New Condition System installed in October of 2007, decommission in Feburary of 2008. Used in a R&D application The Ulvac NE 7800 is a high-temperature, high-density plasma etching system utilizing an Inductive Super Magnetron source (ICP with magnetic field). The NE 7800 is a dual load locked, cassette to cassette system designed for both R&D and production applications. Outstanding metal etching process stability for Pt/Ir/magnetic films and difficult to etch materials such as FeRAM and MRAM devices.