Other Wet Process Equipment
IMTEC ACCUBATH CONSTANT TEMPERATURE QUARTZ BATH
Constant Temperature Bath
Wet Processing Equipment
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Spin Rinse Dryers
SEMITOOL SPIN RINSE DRYER
Dual Stack Spin Rinse Dryer
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Spin Rinse Dryers
SEMITOOL RHETECH SPIN RINSE DRYER
Single Stack Table Top Spin Rinse Dryer
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Acid Wet Stations
REYNOLDSTECH PHOTORESIST DEVELOP HOOD
Photoresist Develop Station with Headway Wafer Spin Cleaner
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Spin Rinse Dryers
SEMITOOL SPIN RINSE DRYER UP TO 125MM
Spin Rinse Dryer up to 125mm Built in Resistivity Monitor
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Spin Rinse Dryers
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM
Spin Rinse Dryer up to 125mm
Built in Resistivity Monitor
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Spin Rinse Dryers
SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 100MM
Spin Rinse Dryer up to 100mm
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Spin Rinse Dryers
SEMITOOL/RHETECH SPIN RINSE DRYER 100 MM
Spin Rinse Dryer up to 100mm
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Manual Spray Brush Scrubbers
HAMATECH AUTOMATIC SUBSTRATE CLEANER
Automatic Substrate Cleaner
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IPA Vapor Dryers
VERTEQ IPA VAPOR DRYER 200 MM
IPA Vapor Dryer IPA 2800 is a drying system using isopropyl alcoholto provide a clean,dry surface on wafers and substratesSystem features a class 10 elevator,ultra-pure nitrogen loading environment,short load-to-vapor time and fast recovery between cyclesThe system is partical netural at 0.2 microns This system is NOT a marangoni style
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Spin Rinse Dryers
SEMITOOL/RHETECH SPIN RINSE DRYER 150 MM ST 460S
Spin Rinse Dryer
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Other Wet Process Equipment
SEMITOOL SPRAY SOLVENT TOOL
Spray Solvent Tool Refurbished by Rhetech in 2000
Photoresist develop/strip, polymer removal, pre-metal deposition cleaning. High speed rinse and dry of wafers, with low particle counts and reduced DI water consumption.