| Unit Price |
Unstated |
| Number of Units |
1 |
| Manufacturer | Oxford Instruments |
| Model | Plasmalab System 100 |
| Description | PECVD TEOS with Load Lock |
| Wafer Size Range |  |
| Maximum | 200 mm |
| Process | PECVD & TEOS |
| Controller Type | PC Controller Type |
| Loadlock | |
| Loadlock Yes/No | YES |
| Loadlock Pump Manufacturer & Model | Alcatel APT 80 Turbo, ACT 200T Controller |
| RF Generator Model | AE LF5 & AE RFX 600A |
| Automatch Text | Oxford Instruments |
| Number of Gas Inputs | Ten Gas |
| Process Gases | See Below |
| Other Information | Advanced Energy LF-5--RF Generator
Advanced Energy RFX 600A--RF Generator
Process Gases
CF4 80%, O2 20%--500 SCCM---MKS 1179A
Ar 90%, PH3 10%--50 SCCM---MKS 1479A
Ar 90%, GeH4 10%--50 SCCM---MKS 1479A
Ar 90%, BeH6 10%--50 SCCM---MKS 1479A
N2 95%, SiH4 5%--1 SLM---MKS 1479A
NH3 100%--100 SCCM---MKS 1479A
N2O 100%--3 SLM---MKS 1179A
N2O 100%--200 SCCM MKS 1179A
N2 100%--2 SLM MKS 1179A
O2 100%--500 SCCM MKS 1179A
Refurbishment to include but not limited to the following;
Cleaning and recalibration of MFCs
Inplace wet cleaning. As option chamber and associated harware can be sent high purity cleaning.
System will be fully functional and source inspection to be performed at our facility with inert gases
|
| Power Requirements | 208 V
25.6 A
50/60 Hz
3 Phase
|
| CE Marked | YES |
| Year of Manufacture | 2001 |
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