OXFORD INSTRUMENTS PLASMALAB 100 PECVD
PECVD TEOS Tool with Load Lock
NB: System needs a computer-software upgrade. Selling this system AS IS, WHERE IS.
PECVD TEOS Tool with Load Lock
NB: System needs a computer-software upgrade. Selling this system AS IS, WHERE IS.
Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes.
Other Chemical Vapor Deposition Equipment
Chambers are unused and were never commissioned.
Susceptor, gas shower and other chamber kitting not included.
EPI 3 1/4" Barrel Susceptor MTC EPI Reactor Parts For 3 Inch Wafers
Other Chemical Vapor Deposition Equipment
Bubbler Heat Exchanger
Silicon Carbide 200 mm Disc Susceptor Carbone of America Part number 017893-001
Other Chemical Vapor Deposition Equipment
Other Chemical Vapor Deposition Equipment
Bubbler Heat Exchanger
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