PLASMA-THERM DUAL PLASMA ETCH AND REACTIVE ION ETCH SYSTEM 200MM
Metal Etchers
Dual Plasma Etch and Reactive
Ion Etch Processing Systems
System consists of a process chamber, upper electrode (with gas feed), and substrate electrode.
1 unit @ Best Price
Make: Plasma-Therm
Model: Wafer Batch 740/740
Item ID: 3011
Manufacturer | Plasma-Therm |
Model | Wafer Batch 740/740 |
Wafer Size Range | |
Minimum | 100 mm |
Maximum | 200 mm |
Process | Plasma and Reactive Ion Etch |
Controller Type | Microprocessor Controller Type |
End Point Detection | Included |
High Vacuum Pump | Leybold 361C |
Roughing Pump | Ebara A10S |
RF Generator Model | None |
Number of Gas Inputs | Four Gas |
Chillers | |
Number of Chillers | 1 |
Chiller #1Manufacturer/Model | Tek-Temp MM1500/3000 |
Other Information | Refurbishment to include the following:
|
Exterior Dimensions | |
Width | 45.000 in (114.3 cm) |
Depth | 43.000 in (109.2 cm) |
Height | 73.000 in (185.4 cm) |
Shipping & Handling
Our standard procedure is to service the equipment as orders are placed. Lead times can vary depending on the item.
Domestic and International shipments: Ex Works, Scotia, NY. All freight cost estimates are for dock to dock service only.
Any additional services, i.e. lift-gate, inside or residential delivery, must be requested at the time of sale and will be billed accordingly.
CBI is not responsible for any damage incurred during shipment. It is the buyer's responsibility to inspect packages for damage and to note any damage on bill of lading.
Please feel free to call us with any questions. (Phone: 518.346.8347, 844-833-8347, Fax: 518.381.9578).
Payment
We offer terms of net 30 days to all companies that have established credit with Capovani Brothers Inc. and have paid within terms.
All federal, state, local governments and their agencies, as well as institutions of higher learning automatically receive terms.
All other sales, including foreign sales, are prepayment only.
MasterCard, VISA, Discover and AMEX are accepted at sellers discretion.