Robotic PR Coater Tracks
Robotic PR Coater Tracks
Automated Coating and Developing Cluster System
Fully Automated High Throughput Coating, Developing Cluster System System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
Robotic PR Coater Tracks
Dual Track Coat System
Manual Photoresist Coaters
Manual Photoresist Spin Coater
Manual Photoresist Coaters
Automatic Photoresist Coater System is designed exclusively to coat and bake substrates using spinning and heating techniques.
BLE was acquired by Suss Microtec
Standard Photoresist DevTracks
Automatic Two-station Photoresist Coat & Bake Designed to coat and soft bake semiconductor wafers.
Standard Photoresist DevTracks
Temperature Controlled Positive Developer with Hot Plate Bake Designed to develop and hard bake semiconductor wafers.
Manual Photoresist Coaters
Spin Coater
Manual Photoresist Coaters
Dip Coater
Photoresist Curing Tools
Single Track Hot Plate Oven Silicon Valley Group 8136