BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM
Programmable Automated Coat/Bake Track System
Programmable Automated Coat/Bake Track System
Automated Coating and Developing Cluster System
Fully Automated High Throughput Coating, Developing Cluster System System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
Manual Photoresist Spin Coater
Automatic Photoresist Coater System is designed exclusively to coat and bake substrates using spinning and heating techniques.
BLE was acquired by Suss Microtec
Standard Photoresist DevTracks
Automatic Two-station Photoresist Coat & Bake Designed to coat and soft bake semiconductor wafers.
Single Track Hot Plate Oven Silicon Valley Group 8136
Standard Photoresist DevTracks
Temperature Controlled Positive Developer with Hot Plate Bake Designed to develop and hard bake semiconductor wafers.
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