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The AX7610 is a microwave plasma source for downstream chemical etch applications,
such as photoresist stripping and hard mask removal.
With replaceable quartz or sapphire tubes, the AX7610 downstream source offers flexibility of configuration to meet the most demanding application process parameters.
The sapphire tube version is compatible with much more severe CF4 and NF3 chemistries for isotopic etch and other applications.
Sapphire Plasma Source Tube
Applied part number: 3750-0112
Max power output: 3 kW
Inert gas fitting: 1/4" VCR
Output flange: KF 40
Operating pressure: 2 to 8 Torr
Elect requirments: 24VDC 1 Amp
Process gas compatibility:
O2, N2, H2O, Ar, NF3, CF4, F6, and other Florine based gases