System Specifications
Combination high-vac valve,trap and pump
Micrometer adjustable,variable orifice throttle valve
CTI ON Board 10 cryopump with 9600 compressor(water cooled)
CTI On Board auto regeneration control
Edwards E2M80 mechanical pump
Mass-Vac Posi-Trap model 345040 molecular sieve trap
Soft vent
Soft roughing
Vacuum manifolding
Granville-Phillips model 307 ion gauge control
28.5" diameter by 16" tall deposition chamber
29" Diameter process/source chamber mounting plates
Source plate has two blank off plates for unused 8" source positions
Upper mounting plate for cathode,heater array and lower plate for fixturing
Upper and lower plate hoists
Motorized hoists with adjustable limit switches
Flag shutter
Advanced Energy 3KW RF sputter power supply
Heater array/Heater power supply for high pressure operation
(1) Magnetron Cathode: 8 inch
Inficon IC 5 rate and thickness deposition controller,configured for time/power control with 3.5" floppy disc drive intergrated for control of the shutter and sputter power supply.
Mass flow gas control (02/Ar)
MKS model 247 power supply/readout
Two model 2179 mass flow controlers with positive shutoff valves
MKS model 250 pressure controler
MKS model 627 pressure transducer
Industrial grade Siemens PC, 64MB RAM,10.4" TFT color monitor
Windows NT 4.0 WONDERWARE software
Controls multi layer,sequential process intergrating the operation,all the controls and power supplies
Manual vent switch
Roughing over-time and chamber over pressure interlocks
