Plasma-Therm Wafer Batch 740/740 Etching System

Quoted on requestWorking & warranted

Condition: Used
Brand: Plasma-Therm
MPN: Wafer Batch 740/740
SKU: 3011
Availability: 1 in stock

Item description

Refurbishment to include the following

Control Upgrade

Our operating system upgrade has been developed as a direct replacement control system for PlasmaTherm process tools using off-the-shelf IO components and modern Windows Vista compatible control system software. A complete replacement of all IO and signal wiring is performed. None of the original IO is used. A full set of system documentation is provided which includes wiring diagrams, IO listings, OEM equipment spec sheets, and full system software source code.
MFCs will be sent out for cleaning and recalibration; filters will be replaced.
Wet clean of process chambers.
Installation of rebuilt Leybold 361C turbo pump and controller.

NB: Please note that the dual chamber configuration is designed to operate sequentially. The RF generator and vacuum sources are shared for each process chamber. However each chamber has its own set of four MFCs.

Specifications

Process: Plasma and Reactive Ion Etch
Controller Type: Microprocessor Controller Type
End Point Detection: Included
High Vacuum Pump: Leybold 361C
Roughing Pump: Ebara A10S
RF Generator Model: None
Number of Gas Inputs: Four Gas

Wafer Size Range

Minimum: 100 mm
Maximum: 200 mm

Chillers

Number of Chillers: 1
Chiller #1Manufacturer/Model: Tek-Temp MM1500/3000

Exterior Dimensions

Width: 45.000 in (114.3 cm)
Depth: 43.000 in (109.2 cm)
Height: 73.000 in (185.4 cm)

Working & Warranted
Working & Warranted means the item has been inspected by Capovani engineers to confirm functional condition and is sold with a 90 day warranty.
Our standard procedure is to service the equipment as orders are placed. Lead times can vary depending on the item.
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