E-Beam Evaporator with Ion Source

Six Pocket Ebeam Gun, (2)Resistance Sources, 6kW Heater Array, 25.5" Bell Jar, Cryo Pumped The CHA SEC-1000-RAP high-vacuum EBeam deposition system designed for use in production and research environments.

Load locked single wafer sputter, cassette to cassette vertically mounted for sideways sputter

Currently configured for 100mm wafers 3 Target mini-quantums RF Etch VIPS (Vacuum Isolated Processing Station) Residual Gas Analyzer

In-Line Sputter-Etch System

High Volume E Beam Evaporator

E-Beam Deposition System

Filament Evaporator

E Beam Evaporator

Filament Evaporator--Cryo Pumped

Vacuum Chamber

A great core system for a custom project

System sold AS IS

E Beam Evaporator

Reel Coater for Ribbon or Wire

The model 412-3 is a two-chamber reel to reel web coater which deposits metal or alloys on wire or ribbon substrates by sputtering from two magnetron targets arranged in a closely spaced book array. Capacity is based upon 4" ID x 12" OD x 3" wide wire/ribbon spools. Wire diameter up to 0.035" (.9mm) may be coated at speeds ranging between 2 and 40 feet per minute depending on the coating thickness desired. Constant wire speed and tension are controlled in conjunction with other parameters which enable unattended operation for extended periods. A second chamber provides plasma pre cleaning prior to entering the sputter zone through a conductance limiting tube which allows different gas compositions and pressures for cleaning and coating.