E-Beam Evaporator with Ion Source

Six Pocket Ebeam Gun, (2)Resistance Sources, 6kW Heater Array, 25.5" Bell Jar, Cryo PumpedThe CHA SEC-1000-RAP high-vacuum EBeam deposition system designed for use in production and research environments.

Load locked single wafer sputter, cassette to cassette vertically mounted for sideways sputter Currently configured for 100mm wafers3 Target mini-quantumsRF EtchVIPS (Vacuum Isolated Processing Station)Residual Gas Analyzer

E-Beam Deposition System

E Beam Evaporator

High Volume E Beam Evaporator

In-Line Sputter-Etch System

Filament Evaporator

Filament Evaporator--Cryo Pumped

Thin Flim Deposition Controller Uses EIES sensor technology and provides complete automatic control of two materials, either sequential or codeposited vacuum processes

Vacuum Chamber A great core system for a custom project System sold AS IS

E Beam Evaporator