E-Beam Evaporator with Ion Source

Six Pocket Ebeam Gun, (2)Resistance Sources, 6kW Heater Array, 25.5" Bell Jar, Cryo PumpedThe CHA SEC-1000-RAP high-vacuum EBeam deposition system designed for use in production and research environments.

Load locked single wafer sputter, cassette to cassette vertically mounted for sideways sputter Currently configured for 100mm wafers3 Target mini-quantumsRF EtchVIPS (Vacuum Isolated Processing Station)Residual Gas Analyzer

E-Beam Deposition System

E Beam Evaporator

High Volume E Beam Evaporator

In-Line Sputter-Etch System

Filament Evaporator

Filament Evaporator--Cryo Pumped

Vacuum Chamber A great core system for a custom project System sold AS IS

E Beam Evaporator

Reel Coater for Ribbon or Wire The model 412-3 is a two-chamber reel to reel web coater which deposits metal or alloys on wire or ribbon substrates by sputtering from two magnetron targets arranged in a closely spaced book array. Capacity is based upon 4" ID x 12" OD x 3" wide wire/ribbon spools. Wire diameter up to 0.035" (.9mm) may be coated at speeds ranging between 2 and 40 feet per minute depending on the coating thickness desired. Constant wire speed and tension are controlled in conjunction with other parameters which enable unattended operation for extended periods. A second chamber provides plasma pre cleaning prior to entering the sputter zone through a conductance limiting tube which allows different gas compositions and pressures for cleaning and coating.