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Surface Technology Systems Mxp Icp Hr

Item description

ICP V2 - Balun coil

Mechanical Clamp

Helium Backside Cooling

Carousel in MkIV MPX - 2 x 150mm wafers

3KW Source

300/30W platen

Purge gas line

E-Rack Modules: HCL1 +HCU3 +HCU5+VAC3Y +2x AMC1 +HBC2

Windows 2000

Current Power Requirements: 400V , 50Hz, 40 Amp, 3 phase

Unit can be configured for: 208/460, 60 Hz, 3 Phase. Please request at time of purchase.

Process	Chlorine Etch
High Vacuum Pump	Pfeiffer MAG 2000
Roughing Pump	Edwards IQMB250 & IQDP80
RF Generator Model	ENI/ACG-3B and Advanced Energy RFG 3001
Number of Gas Inputs	Five Gas
Process Gases	BCl3, Cl2, O2, Ar, He
CE Marked	YES
Year of Manufacture	2003

Loadlock Yes/No	YES
Loadlock Pump Manufacturer & Model	Edwards E2M40

Number of Chillers	1
Chiller #1Manufacturer/Model	Huber/Unistat 140W

Working & Warranted
Inspected by Capovani engineers to confirm function. Sold with a 90-day warranty covering function. Warranty terms
Lead time varies, confirmed in your quote
These items are inspected and serviced after your order is confirmed. Typical lead time is 1 to 3 weeks. We’ll confirm exact timing when we send your quote.
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